Catalytic Chemical Vapor Deposition

Technology and Applications of Cat-CVD
1. Auflage 2019
ISBN: 978-3-527-34523-6
Verlag: Wiley-VCH GmbH

Buch, Englisch, 440 Seiten, Format (B × H): 179 mm x 252 mm, Gewicht: 988 g

The authoritative reference on catalytic chemical vapor deposition?written by the inventor of the technology

This comprehensive book covers a wide scope of Cat-CVD and related technologies?from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field?including the father of catalytic chemical vapor deposition?it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques.

Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications.

-Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD)
-Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles
-Presents comparisons of different Cat-CVD methods which are usually not found in research papers
-Bridges academic and industrial research?showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry

Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.

Autoren/Hrsg.

Matsumura, Hideki

Umemoto, Hironobu

Gleason, Karen K.

Schropp, Ruud E. I.

Fachgebiete

• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Chemische Reaktionstechnik (incl. Katalyse, Elektrolyse)
• Naturwissenschaften Physik Thermodynamik Oberflächen- und Grenzflächenphysik, Dünne Schichten
• Naturwissenschaften Chemie Anorganische Chemie

Inhaltsverzeichnis

INTRODUCTION
Thin Film Technologies
Birth of Cat-CVD
Research History of Cat-CVD and Related Technologies
Structure of this book

FUNDAMENTALS FOR STUDYING ON PHYSICS OF CAT-CVD AND DIFFERENCE FROM PECVD
Fundamental Physics in Deposition Chamber
Fundamental Difference between Cat-CVD and PECVD Apparatuses
Features of Conventional PECVD
Drawback of PECVD and Technology Overcoming Them
Features of Cat-CVD as Technology Overcoming Drawback of PECVD

FUNDAMENTALS FOR ANALYTICAL METHODS FOR REVEALING CHEMICAL REACTIONS IN CAT-CVD
Importance of Radical Process in CVD Processes
Radical Detection Technique
One-Photon Laser Induced Fluorescence (LIF)
Two-Photon Laser Induced Fluorescence
Single Path VUV Laser Absorption
Other Laser Spectroscopic Techniques
Mass Spectrometric Technique

PHYSICS AND CHEMISTRY OF CAT-CVD
Kinetics of Molecules in Chambers
Gas Temperature Distribution in Cat-CVD Chambers
Decomposition Processes on Metal Wire Surfaces
Model of Decomposition of SiH4 on Metal Surfaces
Summary: Film Deposition Mechanisms in Cat-CVD

PROPERTIES OF FILMS PREPARED BY CAT-CVD
Properties of Amorphous-Silicon (a-Si)
Crystallization of Silicon Films and Micro-Crystalline Silicon
Properties of Silicon-Nitride (SiNx)
Formation and Properties of SiOxNy
Properties of Silicon-Dioxide (SiO2) Prepared by Cat-CVD
Properties of Aluminum-Oxide (Al2O3)
Properties of Other Inorganic Films
Summary: What can be made by Cat-CVD?

ORGANIC POLYMER SYNTHESIS BY CAT-CVD RELATED TECHNOLOGY - INITIATED CVD (I-CVD)
PTFE Synthesis by Cat-CVD Related Technology
Various Organic Films Prepared by Cat-CVD Related Technology and i-CVD
Sources and Deposition Conditions for Synthesized Various Organic Films
Mechanism of Organic Film Formation by i-CVD
Summary and Future Prospect of i-CVD

PHYSICS AND TECHNOLOGIES FOR OPERATING CAT-CVD APPARATUSES
Influence of Gas Flow in Cat-CVD Apparatuses
Factors Deciding Film Uniformity
Limit of Packing Density of Catalyzing Wires
Thermal Radiation from Heated Catalyzers
Contamination from Heated Catalyzers
Lifetime of Catalyzing Wires and Techniques to Expand Lifetime
Chamber Cleaning
Mass-Production Machines

APPLICATIONS OF CAT-CVD FILMS
Solar Cells
Thin Film Transistors (TFT)
Surface Passivation on Compound Semiconductor Devices
Gas Barrier Films for Various Devices Such As Organic Devices
Gas Barrier Films for Food Packages
ULSI Application of Cat-CVD SiNx Films
Other Applications of Inorganic Films
Typical Application of Organic Films
Summary of Various Application and Future Prospects

RADICALS GENERATED IN CAT-CVD APPARATUS AND THEIR APPLICATION
Generation of High Density Hydrogen (H) Atoms
Cleaning and Etching by H Atoms Generated in Cat-CVD Apparatuses
Photo-Resist Removal by Hydrogen Atoms
Low Temperature Formation of Low Resistivity Metal Lines from Liquid Inks by H Atoms
Low Temperature Surface Oxidation and Nitridation
"Cat-Sputtering" - A New Thin Film Deposition Utilizing Radicals

A NEW LOW TEMPERATURE IMPURITY DOPING TECHNOLOGY- CAT-DOPING
Invention of Cat-Doping
Low Temperature and Shallow Phosphorus (P) Doping into c-Si
Low Temperature Boron (B) Doping into c-Si
Low Temperature Nitrogen Doping into Silicon-Carbide (SiC)
Feasibility of Cat-Doping for Various Applications

SUMMARY AND FUTURE PROSPECTS OF CAT-CVD

Über Autor(innen)

Hideki Matsumura, PhD, is Professor Emeritus in the School of Materials Science at the Japan Advanced Institute of Science and Technology (JAIST), Japan.

Hironobu Umemoto, PhD, is Professor of Chemistry and Bioengineering at the Faculty of Engineering of the University of Shizuoka, Japan.

Karen K. Gleason, PhD, is Associate Provost and the Alexander and I. Michael Kasser Professor of Chemical Engineering at MIT, USA.

Ruud E. I. Schropp, PhD, is Senior Researcher at Solliance Solar Research, Eindhoven, the Netherlands.