Buch, Englisch, Format (B × H): 152 mm x 229 mm
Buch, Englisch, Format (B × H): 152 mm x 229 mm
ISBN: 978-0-443-47108-7
Verlag: Elsevier Science & Technology
Advances in Imaging and Electron Physics, Volume 237 merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. Chapters in this new release include Stochastic geometry with applications in materials science, Morphological models of random media, Grain models and application to microstructure simulation, MCMC algorithms for model parameterization, Tessellations models, Tesselation models, Fast simulation of tessellation models using Eikonal equation, Applications to Image Processing, Synthesis of Training Images for Supervised Learning Problems, and Segmentation Methods Based on the Eikonal Equation.
Fachgebiete
- Technische Wissenschaften Sonstige Technologien | Angewandte Technik Angewandte Optik
- Naturwissenschaften Physik Elektromagnetismus Elektrizität, Elektrodynamik
- Technische Wissenschaften Technik Allgemein Technische Optik, Lasertechnologie
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde
- Technische Wissenschaften Sonstige Technologien | Angewandte Technik Lasertechnologie, Holographie
- Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik
- Technische Wissenschaften Elektronik | Nachrichtentechnik Nachrichten- und Kommunikationstechnik Signalverarbeitung
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Maschinenbau
Weitere Infos & Material
Stochastic geometry with applications in materials science - Morphological models of random media
- Grain models and application to microstructure simulation
- MCMC algorithms for model parameterization
Tessellations models - Tesselation models
- Fast simulation of tessellation models using Eikonal equation
Applications to Image Processing - Synthesis of Training Images for Supervised Learning Problems
- Segmentation Methods Based on the Eikonal Equation
