Cathodic Arcs

From Fractal Spots to Energetic Deposition
2. Auflage 2026
ISBN: 978-1-0716-5483-5
Verlag: Springer-Verlag New York Inc.

Buch, Englisch, 701 Seiten, Format (B × H): 155 mm x 235 mm

Reihe: Springer Series on Atomic, Optical, and Plasma Physics

This book, substantially updated since its first publication, is an authoritative and comprehensive treatise on the physics and technology of cathodic arcs. It includes a detailed account of arc history, a textbook-like introduction to cathode phenomena, covers the relevant basic science of plasmas and thin film materials, deals with the infamous macroparticle issue, and describes a host of practical plasma filter solutions. The text pays particular attention to the relation of arc plasmas and their properties to surface modification and thin film deposition. By stressing the fractal nature of cathode spots, the theme of fluctuations can be found throughout the book: fluctuations affect all plasma properties and thereby have consequences for plasma-based surface modifications and film growth. Detailed explanations are complemented by compilations of plasma and materials data arranged in Periodic Tables. Written with researchers and advanced students in the fields of materials science and plasma physics in mind, it is suitable both as a reference work for the expert as well as an introduction for newcomers to the interdisciplinary fields of plasma-surface interaction and plasma-assisted deposition of thin films.

In this second edition, the book has been updated throughout to reflect progress in the understanding of arc physics and technology, and contains new material on deposition efficiency, and the influence of kinetic and potential ion energies on the microstructure of coatings, enhanced with new illustrations. The discussion of applications now includes new material on implications for renewable energy, environmentally-friendly materials, power switching, and space propulsion facilitated by vacuum arcs.

Zielgruppe

Research

Autoren/Hrsg.

Anders, André

Fachgebiete

• Naturwissenschaften Physik Quantenphysik Atom- und Molekülphysik
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Verfahrenstechnik, Chemieingenieurwesen
• Naturwissenschaften Physik Thermodynamik Oberflächen- und Grenzflächenphysik, Dünne Schichten
• Naturwissenschaften Physik Angewandte Physik Chemische Physik
• Naturwissenschaften Physik Thermodynamik Plasmaphysik

Inhaltsverzeichnis

A History of Cathodic Arcs and Arc Coatings.- The Physics of Cathode Processes.- The Interelectrode Plasma.- Cathodic Arc Plasma Sources.- Microparticles.- Plasma Filters.- Energetic Deposition of Coatings in Vacuum and in Gases.- Cathodic Arc Coatings and Their Applications.- High-Power Switching, Electric Propulsion and other Applications of Cathodic Arcs.- Supplementary Material: A Concise Presentation of Plasma and Sheath Formula, and Periodic Tables of Cathode and Vacuum Arc Properties.

Über Autor(innen)

André Anders is a leading expert in plasma science and vacuum arc technology, with more than four decades of experience spanning fundamental research and industrial applications. He is the Founder and CEO of Plasma Engineering LLC, an Affiliate Scientist at Lawrence Berkeley National Laboratory, Berkeley, California, and he previously served as Director of the Leibniz Institute of Surface Engineering (IOM) and Professor of Applied Physics at Leipzig University in Leipzig, Germany.

With over 300 publications in peer-reviewed journals, Anders has made significant contributions to the understanding of cathodic (vacuum) arcs and the development of arc-based coating technologies. His work bridges plasma physics and materials science, combining detailed studies of arc plasmas with practical solutions for advanced surface engineering.

He served as Editor-in-Chief of the Journal of Applied Physics from 2014 to 2024 and is a Fellow of IEEE, APS, AVS, and the Institute of Physics.