Photomask Fabrication Technology

Erscheinungsjahr 2005
ISBN: 978-0-07-144563-4
Verlag: McGraw-Hill

Buch, Englisch, 500 Seiten, Format (B × H): 157 mm x 235 mm, Gewicht: 991 g

Publisher's Note: Products purchased from Third Party sellers are not guaranteed by the publisher for quality, authenticity, or access to any online entitlements included with the product.

Photomasks are defect-free optical templates -- the printing masters for the fabrication of integrated circuits (ICs). When IC feature sizes fall below the exposure tool’s source wavelength, photomask fabrication becomes difficult: very strict mask critical dimension (CD) and feature placement specifications, intensive capital equipment investment, unique raw materials and applications, and special expertise requirements for photomask fabrication technologists are necessary to fabricate modern microelectronics. Thus the rapid recent growth of the field and the need for this book.

This text details the science and technology of industrial photomask production, including fundamental principles, industrial production flows, technological evolution and development, and state of the art technologies. Focusing on industrial applications rather than pure science, the goal of the book is to provide a comprehensive reference for any engineer developing microelectronic manufacturing processes

Autoren/Hrsg.

Eynon, Benjamin

Wu, Banqiu

Fachgebiete

• Technische Wissenschaften Energietechnik | Elektrotechnik Elektrotechnik

Inhaltsverzeichnis

IntroductionData Preparation and DesignPattern GenerationPattern TransferPhotomask MetrologyDefect Control and FinishingInspection, Repair, and CleaningResolution Enhancement TechniquesWater Fabrication IssuesFuture DevelopmentsAppendicesReferences

Über Autor(innen)

Eynon, Benjamin
Benjamin G. Eynon, Jr. (Austin, TX) is currently Director of Advanced Technology Development at Photronics, Inc. He has over 18 years of experience in the semiconductor industry in technology development and manufacturing. He sits on a number of international professional conferences committees, and is a reviewer of peer-reviewed technology journal articles. He holds two US patents and has over 25 professional publications.

Wu, Banqiu
Dr. Banqiu Wu (Austin, TX) is currently a Staff Scientist with Photronics, Inc. He has expert level hands-on photomask fabrication experience in the pattern transfer process. He holds several patents, over 30 technological publications, and several awards. Before coming to the US, he was an associate professor in Harbin Institute of Technology, Harbin, China.

Benjamin G. Eynon, Jr., is Senior Director of Product Marketing at KLA-Tencor Corporation. He has more than 18 years of experience in wafer and photomask industry technology. Banqiu Wu, Ph.D. is a Senior Staff Scientist at Photronics, Inc. He has expert-level photomask fabrication experience in the pattern transfer process.