Buch, Englisch, 306 Seiten, Format (B × H): 178 mm x 254 mm, Gewicht: 567 g
Volume II
Buch, Englisch, 306 Seiten, Format (B × H): 178 mm x 254 mm, Gewicht: 567 g
ISBN: 978-1-315-89752-3
Verlag: Taylor & Francis Ltd
This book focuses on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. It discusses the obstacles any new technology must overcome to be commercially successful with specific references to the challenges confronting Silicon-Molecular Beam Epitaxy.
Autoren/Hrsg.
Fachgebiete
Weitere Infos & Material
9. Principles of Heteroepitaxy 10. Epitaxial Silicides 11. Silicon-Based Semiconductor Heterostructures 12. Assessment of Layers 13. Industrial Application: Perspective and Requirements 14. Industrial Application: Possible Approaches 15. Molecular Beam Epitaxy of Silicon Materials: A Bibliography 1962 - 1985