29th European Symposium on Computer Aided Chemical Engineering, Volume 46

Erscheinungsjahr 2019
ISBN: 978-0-12-818634-3
Verlag: ELSEVIER

Medienkombination, Englisch, Band 46, 1892 Seiten, Format (B × H): 201 mm x 239 mm, Gewicht: 2449 g

Reihe: Computer Aided Chemical Engine

The 29th European Symposium on Computer Aided Process Engineering, contains the papers presented at the 29th European Symposium of Computer Aided Process Engineering (ESCAPE) event held in Eindhoven, The Netherlands, from June 16-19, 2019. It is a valuable resource for chemical engineers, chemical process engineers, researchers in industry and academia, students, and consultants for chemical industries.

Autoren/Hrsg.

Kiss, Anton A.

Zondervan, Edwin

Lakerveld, Richard

Özkan, Leyla

Fachgebiete

• Technische Wissenschaften Technik Allgemein Computeranwendungen in der Technik
• Mathematik | Informatik EDV | Informatik Angewandte Informatik Computeranwendungen in Wissenschaft & Technologie
• Technische Wissenschaften Verfahrenstechnik | Chemieingenieurwesen | Biotechnologie Chemische Verfahrenstechnik

Inhaltsverzeichnis

29th European Symposium on Computer Aided Process Engineering

Über Autor(innen)

Kiss, Anton A.
Tony Kiss is a professor and chair in chemical engineering at The University of Manchester, and a Royal Society Wolfson Research Merit Award holder. He has over a decade of industrial experience, working as Senior Project Manager and RD&I Specialist in Separation Technology at AkzoNobel – Research, Development & Innovation. Besides his industrial role, he has been appointed as part-time professor of Separation Technology at University of Twente (Sustainable Process Technology group). He holds a PhD title from University of Amsterdam, and he was also Post Doctoral research fellow at TU Delft and University of Amsterdam. During the past decade, he carried out many research & industrial projects, supervised graduation projects, published several textbooks, book chapters, and over 100 scientific articles. For the pioneering research work, he received in 2013 the Hoogewerff Jongerenprijs – a very prestigious award recognizing the most promising young scientist in The Netherlands. He also led his research team to receive in 2013 the AkzoNobel Innovation Excellence Award for the most successful industrial innovation. More information is available at: www.tonykiss.com

Zondervan, Edwin
University of Bremen, Germany

Lakerveld, Richard
The Hong Kong University of Science and Technology, Hong Kong

Özkan, Leyla
Eindhoven University of Technology, The Netherlands