Run-To-Run Control in Semiconductor Manufacturing

1. Auflage 2000
ISBN: 978-0-8493-1178-9
Verlag: CRC Press

Buch, Englisch, 366 Seiten, Format (B × H): 161 mm x 242 mm, Gewicht: 617 g

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

Autoren/Hrsg.

Moyne, James

del Castillo, Enrique

Hurwitz, Arnon M.

Fachgebiete

• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Halb- und Supraleitertechnologie
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Produktionstechnik Fertigungstechnik

Inhaltsverzeichnis

Introduction. Background. Identifying Target Applications for Run-to-Run Control. Developing a Run-to-Run Solution: Run-to-Run Algorithms. Developing a Run-to-Run Solution: Practical Extensions to Algorithms. Developing and Deploying Run-to-Run Solutions: Integrating Control. Run-to-Run Control System Deployment Case Studies. Advanced Topics. Conclusions. References.

Über Autor(innen)

James Moyne, Enrique del Castillo, Arnon M. Hurwitz