Radio Frequency Sputtering

Thin-Film Deposition and Device Applications
1. Auflage 2026
ISBN: 978-3-527-35622-5
Verlag: Wiley-VCH GmbH

Buch, Englisch, 432 Seiten, Format (B × H): 170 mm x 244 mm

Fundamental and advanced RF sputtering techniques for thin-film applications

Controlling film thickness, composition, and uniformity remains a persistent challenge in thin-film fabrication. Radio Frequency Sputtering: Thin-Film Deposition and Device Applications covers both fundamental principles and advanced techniques of RF sputtering. Written by researchers from academic and industry laboratories, this reference provides practical guidance for optimizing deposition processes across electronic components, solar cells, and functional coatings.

The book provides step-by-step instructions for RF sputtering processes alongside clear definitions and illustrative examples. Dedicated sections on troubleshooting and process optimization offer targeted advice for overcoming common deposition challenges. Coverage extends to sustainability practices in sputtering operations and examines both established and emerging device applications, connecting process parameters to measurable outcomes in device performance.

Readers will also find: - Detailed treatment of RF magnetron sputtering configurations and their influence on film quality across different substrate materials
- Guidance on controlling deposition parameters to achieve target film thickness, composition, and structural uniformity in production environments
- Coverage of thin-film applications in semiconductor devices, energy harvesting systems, and advanced functional coatings for diverse industries
- Discussion of emerging applications including spintronic devices, memory technologies, and materials designed for high-radiation environments
- Practical frameworks for integrating sustainability considerations into RF sputtering workflows and laboratory or manufacturing operations

Radio Frequency Sputtering serves materials scientists, semiconductor physicists, and engineers working in thin-film fabrication across academic and industrial settings. By connecting deposition fundamentals with device-level outcomes, this reference supports practitioners seeking to optimize RF sputtering processes for both research and production applications.

Autoren/Hrsg.

Sharma, Aditya

Lim, Weon Cheol

Sharma, Poorva

Singh, Jitendra Pal

Fachgebiete

• Naturwissenschaften Physik Thermodynamik Oberflächen- und Grenzflächenphysik, Dünne Schichten
• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Halb- und Supraleitertechnologie
• Naturwissenschaften Physik Elektromagnetismus Halbleiter- und Supraleiterphysik

Inhaltsverzeichnis

Part 1: Phenomena
1. Mechanistic Understanding of Sputtering
2. Advancement in Sputtering Experimental Set-Up
3. Hybrid Sputtering Systems
4. Phenomenological Understanding of Film Growth by Sputtering
5. Atomic-Scale Understanding of Sputtering-Assisted Film Growth by X-Ray Absorption
 
Part 2: Film Growth Examples
6. Epitaxial Growth via Radio Frequency Sputtering Process
7. Deposition of Layers for Solar Cells
8. Sputtering-Assisted Growth of Magnetic Thin Films
9. Sputtering for Growth of Oxides from Metal Targets
 
Part 3: Types of Sputtering
10. Ion Beam Sputtering
11. High Power Pulsed Magnetron Sputtering
12. Reactive Magnetron Sputtering
 
Part 4: Industrial Applications
13. Sputtering for Development of Magnetic Tunnel Junctions
14. Deposition of Thin Films for AMR Devices
15. Sputtering for Thin Film Batteries
16. Sputtering for Semiconductor Devices

Über Autor(innen)

Dr. Aditya Sharma is an Associate Professor of Physics at UPES, Dehradun, India. He has extensive experience in energy harvesting and conversion, thin films, and nanomaterials, and has guided numerous PhD and MS. students. Dr. Sharma has held research positions in South Korea and India.
 
Dr. Weon Cheol Lim is a Senior Research Scientist at the Korea Institute of Science and Technology (KIST), Seoul, South Korea. He specializes in thin film deposition using RF magnetron sputtering and ion implantation. Dr. Lim's research focuses on testing the reliability of materials and devices in high-radiation environments, such as space and nuclear reactors.
 
Dr. Poorva Sharma is an Associate Professor at Luzhou Vocational and Technical College, Luzhou, Sichuan, China. She earned her PhD in Physics from Devi Ahilya University, Indore, India. Her research focuses on multifunctional multiferroic materials for advanced spintronic and memory devices. Dr. Sharma has published over 50 scientific papers and has received several prestigious awards.
 
Dr. Jitendra Pal Singh is a Visiting Scientist at the Korea Institute of Science and Technology, South Korea. He earned his PhD from Govind Ballabh Pant University of Agriculture and Technology, Pantnagar, India. Dr. Singh's research interests include irradiation studies in nanoferrites, thin films, and magnetic multilayers. He has held research positions in India, Taiwan, and South Korea.