Buch, Englisch, Band 537, 554 Seiten, Format (B × H): 158 mm x 234 mm, Gewicht: 880 g
Reihe: ACS Symposium Series
Resists and Dielectrics
Buch, Englisch, Band 537, 554 Seiten, Format (B × H): 158 mm x 234 mm, Gewicht: 880 g
Reihe: ACS Symposium Series
ISBN: 978-0-8412-2721-7
Verlag: American Chemical Society
Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.




