- Neu
Buch, Englisch, 88 Seiten, Format (B × H): 170 mm x 240 mm, Gewicht: 300 g
Buch, Englisch, 88 Seiten, Format (B × H): 170 mm x 240 mm, Gewicht: 300 g
ISBN: 978-3-0364-0917-7
Verlag: Trans Tech Publications
This special edition provides a focused overview of the state of the art in the areas of control, analysis of characteristics, and effect compensation of silicon carbide structure defects, highlighting the scientific foundations and technological solutions that underpin the development of high-quality SiC devices.
Autoren/Hrsg.
Fachgebiete
- Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Elektronische Baugruppen, Elektronische Materialien
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik
- Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Halb- und Supraleitertechnologie
Weitere Infos & Material
Preface
Deep-Ultraviolet Laser-Based Defect Inspection of Single-Crystal 4H-SiC and SmartSiCTM Engineered Substrates for High Volume Manufacturing
Study of In-Grown Micropipes in 200 mm 4H-SiC (0001) Epitaxial Substrate
Demonstration of Suppressing 1SSF Expansion Using Energy Filtered Ion Implantation
Analysis of Trap Centers Generated by Hydrogen Implantation in 4H-SiC Bonded Substrates
Analysis of Lattice Damage in 4H-SiC Epiwafers Implanted with High Energy Al Ions with Silicon Energy-Filter for Ion Implantation
Formation Mechanism and Complex Faulting Behavior of a BPD Loop in 180 µm Thick 4H-SiC Epitaxial Layer
Evaluation of 4HSiC Epitaxial CVD Process on Different 200 mm Substrates for Power Device Applications
Characterization of Interface Trap and Mobility Degradation in SiC MOS Devices Using Gated Hall Measurements
Numerical Analysis of Correlation between UV Irradiation and Current Injection on Bipolar Degradation in PiN Diodes
Investigation on Bipolar Degradation Caused by Micropipe in 3.3 kV SiC-MOSFET
Suppression and Analysis of Bipolar Degradation in 4H-SiC PiN Diodes through Proton Implantation