Optical Imaging and Sensing

Materials, Devices and Applications
1. Auflage 2023
ISBN: 978-3-527-34976-0
Verlag: WILEY-VCH

Buch, Englisch, 288 Seiten, Format (B × H): 170 mm x 244 mm, Gewicht: 616 g

This book provides recent significant developments of materials and devices for optical imaging and sensing. It covers almost all the aspects related to physical optical sensor.

Autoren/Hrsg.

Wu, Jiang

Xu, Hao

Fachgebiete

• Technische Wissenschaften Elektronik | Nachrichtentechnik Nachrichten- und Kommunikationstechnik
• Naturwissenschaften Chemie Analytische Chemie Massenspektrometrie, Spektroskopie, Spektrochemie
• Mathematik | Informatik EDV | Informatik Informatik Bildsignalverarbeitung
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik

Inhaltsverzeichnis

Introduction of Optical Imaging and Sensing: Materials, Devices, and Applications
2D Materials-Based Photodetectors for Imaging
Surface Plasmonic Resonance Enhanced Infrared Photodetectors
Optical Resistance Switch for Optical Sensing
Optical Interferometric Sensing
Spatial Frequency Shift Super-Resolution Imaging Based on Micro/Nanomaterials
Monolithically Integrated Multi-Section Semiconductor Lasers: Towards the Future of Integrated Microwave Photonics

Über Autor(innen)

Dr. Wu received his PhD degree in Electrical Engineering from the University of Arkansas-Fayetteville in 2011. He was with University of Electronic Science and Technology of China (UESTC) as an Associate Professor and then Professor at UESTC from 2011 to 2015. He joined the Photonics group at University College London as a Research Associate in 2012. From 2015, he was a Lecturer/Assistant Professor at UCL. Since 2019, he has been a full Professor at UESTC. His research interests focus on epitaxial growth of compound semiconductors, optoelectronic devices, and sensors. He has developed high-performance III-V mid-infrared detectors, III-V lasers, and a variety of novel optoelectronic devices based low-dimensional semiconductors. He has published more than 150 technical papers in journals with an h-Index of over 40. He is a Fellow of Higher Education Academy, IEEE Senior Member, and Chinese Society for Optical Engineering Senior Member. He serves as the Editor-in-Chief of Nanoscale Research Letters, Associate Editor of IEEE Access, Associate Editor of Frontiers in Electronics, and Editorial Board Member of Experiment Science and Technology, BMC Materials, Scientific Reports, and Nano-Micro Letters.
 
Dr. Xu is now a research fellow at University of Electronic Science and Technology of China (UESTC), awarded the International Postdoctoral Exchange Fellowship, and a visiting researcher at Nanyang Technological University (NTU). Dr. Xu received his master degree in Microelectronics from the Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, and achieved his PhD degree in Photonics and Nanotechnology from University College London (UCL). His current research is centered on low-dimensional material physics and their applications for nanoelectronics and optoelectronics. He serves as the editorial board member of Frontiers in Electronics and the guest editors of Nanoscale Research Letters and Journal of Nanomaterials.