Cali / Belcher / Gordon Trace Analysis of Semiconductor Materials

International Series of Monographs on Analytical Chemistry
1. Auflage 2013
ISBN: 978-1-4831-5255-4
Verlag: Elsevier Science & Techn.
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 292 Seiten, Web PDF

Trace Analysis of Semiconductor Materials is a guidebook concerned with procedures of ultra-trace analysis. This book discusses six distinct techniques of trace analysis. These techniques are the most common and can be applied to various problems compared to other methods. Each of the four chapters basically includes an introduction to the principles and general statements. The theoretical basis for the technique involved is then briefly discussed. Practical applications of the techniques and the different instrumentations are explained. Then, the applications to trace analysis as pertaining to semiconductor materials are discussed. Chapter 1 discusses radiochemical practice, the analysis of semiconductor materials, separation techniques, several qualitative radiochemical schemes, radiochemical purification procedures, and several earlier reported studies. Chapter 2 covers emission spectroscopy, including its potential for future applications. Discussions in Chapter 3 explain the benefits of each of the four mass spectrometric methods, namely, the isotope dilution method, complete thermal vaporization, vacuum spark technique, and the ion bombardment method. Chapter 4 focuses on the absorption, fluorescence, and polarographic methods used in general trace analysis, including examples of semiconductor material applications and other problems that result when certain impurities are introduced into the test sample. This monograph will be useful for researchers in ultra-trace analysis, nuclear physics, and analytical chemistry.

Autoren/Hrsg.

Cali, J. Paul

Belcher, R.

Gordon, L.

Inhaltsverzeichnis

1;Front Cover;1
2;Trace Analysis of Semiconductor Materials;4
3;Copyright Page ;5
4;Table of Contents;6
5;PREFACE;8
6;INTRODUCTION;12
7;CHAPTER 1. NEUTRON ACTIVATION ANALYSIS;17
7.1;INTRODUCTION;17
7.2;ACTIVATION ANALYSIS EQUATIONS;17
7.3;GENERAL RADIOCHEMICAL PRACTICE;19
7.4;THE DESIGN OF A RADIOCHEMICAL PROCEDURE;23
7.5;INTERFERING AND COMPETING REACTIONS;33
7.6;DETECTION AND MEASUREMENT OF RADIATION;38
7.7;SEPARATION PROCEDURES;52
7.8;QUALITATIVE PROCEDURES;65
7.9;RADIOCHEMICAL PURIFICATION PROCEDURES;70
7.10;SODIUM;71
7.11;MAGNESIUM;72
7.12;SILICON;73
7.13;PHOSPHORUS;74
7.14;SULFUR;74
7.15;CHLORINE;75
7.16;POTASSIUM;76
7.17;CALCIUM;76
7.18;SCANDIUM;77
7.19;TITANIUM;78
7.20;VANADIUM;78
7.21;CHROMIUM;79
7.22;MANGANESE;79
7.23;IRON;80
7.24;COBALT;81
7.25;NICKEL;81
7.26;COPPER;82
7.27;ZINC;83
7.28;GALLIUM;83
7.29;GERMANIUM;84
7.30;ARSENIC;85
7.31;SELENIUM;86
7.32;BROMINE;87
7.33;RUBIDIUM;87
7.34;STRONTIUM;88
7.35;YTTRIUM (RARE EARTHS);89
7.36;ZIRCONIUM (HAFNIUM);89
7.37;NIOBIUM;90
7.38;MOLYBDENUM;91
7.39;RUTHENIUM;92
7.40;RHODIUM;92
7.41;PALLADIUM;93
7.42;SILVER;93
7.43;CADMIUM;94
7.44;INDIUM;95
7.45;TIN;96
7.46;ANTIMONY;96
7.47;TELLURIUM;97
7.48;IODINE;98
7.49;CESIUM;98
7.50;BARIUM;99
7.51;YTTRIUM, LANTHANUM AND RARE EARTHS;99
7.52;CERIUM;100
7.53;TANTALUM;101
7.54;TUNGSTEN;101
7.55;RHENIUM;102
7.56;OSMIUM;103
7.57;IRIDIUM;104
7.58;PLATINUM;104
7.59;GOLD;105
7.60;MERCURY;106
7.61;THALLIUM;106
7.62;BISMUTH;107
7.63;URANIUM;108
7.64;TABLES OF ANALYTICAL RESULTS;109
7.65;CHARGED PARTICLE ACTIVATION ANALYSIS;110
7.66;REFERENCES AND BIBLIOGRAPHY;142
7.67;REFERENCES;146
8;CHAPTER 2. EMISSION SPECTROSCOPY;152
8.1;INTRODUCTION;152
8.2;INSTRUMENTATION;154
8.3;ANALYTICAL TECHNIQUES;158
8.4;CURRENT STATUS OF THE TECHNOLOGY;167
8.5;PROSPECTS FOR FUTURE APPLICATIONS;172
8.6;REFERENCES;178
9;CHAPTER 3. MASS SPECTROMETRIC METHODS;180
9.1;INTRODUCTION;180
9.2;SURVEY OF MASS SPECTROMETRIC INSTRUMENTATION;181
9.3;MASS SPECTROMETRIC METHODS;193
9.4;CONCLUSIONS;213
9.5;ACKNOWLEDGEMENTS;216
9.6;REFERENCES;216
10;CHAPTER 4. ABSORPTION, FLUORESCENCE AND POLAROGRAPHIC METHODS;219
10.1;INTRODUCTION;219
10.2;REFERENCE;220
11;SECTION I. ABSORPTION SPECTROPHOTOMETRY;221
11.1;INTRODUCTION;221
11.2;THEORETICAL PRINCIPLES;222
11.3;PRACTICAL CONSIDERATIONS;224
11.4;APPLICATION IN TRACE ANALYSIS WITH SPECIAL REFERENCE TO SEMICONDUCTOR MATERIALS;230
11.5;REFERENCES;240
12;SECTION II. FLUORIMETRY AND SPECTROFLUORIMETRY;241
12.1;INTRODUCTION;241
12.2;THEORETICAL PRINCIPLES;242
12.3;PRACTICAL CONSIDERATIONS;245
12.4;GENERAL APPLICATION TO TRACE ANALYSIS;250
12.5;SPECIFIC APPLICATIONS TO SEMICONDUCTOR MATERIALS;252
12.6;REFERENCES;258
13;SECTION III. POLAROGRAPHY;260
13.1;THEORETICAL PRINCIPLES;260
13.2;EXPERIMENTAL LIMITATIONS;267
13.3;PRACTICAL CONSIDERATIONS;270
13.4;APPLICATION IN TRACE ANALYSIS;275
13.5;REFERENCES;284
14;SUBJECT INDEX;286