Elwell / Scholes Analysis of Copper and Its Alloys

1. Auflage 2013
ISBN: 978-1-4831-4950-9
Verlag: Elsevier Science & Techn.
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 198 Seiten, Web PDF

Analysis of Copper and Its Alloys provides important information for the satisfactory analysis of typical industrial products. This book presents several instrumental methods for analysis, which involve the use of instruments that are familiar, even in small laboratories. Organized into 34 chapters, this book starts with an overview of the various factors that are common to most methods of sampling copper-base materials, regardless of the quality and quantity of material to be sampled. This text then discusses the safety precautions pertaining to the handling of reagents and apparatus. Other chapters consider the factors that influence the determination when copper is electrolytically deposited in the conventional way, including the simultaneous co-deposition of other metals, the retention of copper, and the inhibiting effect of metals. This book discusses as well the presence of refractory tin oxide in tin-bearing alloys. This book is a valuable resource for chemists, teachers, students, and researchers.

Autoren/Hrsg.

Elwell, W. T.

Scholes, I. R.

Inhaltsverzeichnis

1;Front Cover;1
2;Analysis of Copper and its Alloys;4
3;Copyright Page ;5
4;Table of Contents;6
5;ACKNOWLEDGMENTS;10
6;PREFACE;12
7;CHAPTER 1. SAMPLING;16
8;CHAPTER 2. GENERAL INFORMATION;18
9;CHAPTER 3. COPPER;22
9.1;3.1 Refined and Deoxidised Copper;30
9.2;3.2 Simple Brasses, Cupro-Nickel and Copper/Tellurium;31
9.3;3.3 Leaded Brass;32
9.4;3.4 Copper/Cadmium Alloys;32
9.5;3.5 Samples Containing Chromium or Silicon;33
9.6;3.6 Samples Containing Tin;33
9.7;3.7 Routine Procedure;34
9.8;3.8 Standard Procedure;35
9.9;3.9 Procedure;35
10;CHAPTER 4. ALUMINIUM;37
10.1;4.1 Gravimetric Procedure;40
10.2;4.2 Bromometric Volumetric Procedure;43
10.3;4.3 Rapid Volumetric (EDTA) Procedure;44
10.4;4.4 Volumetric (EDTA) Procedure;45
10.5;4.5 Direct Absorptiometric Procedure;47
10.6;4.6 Absorptiometric Procedure;48
11;CHAPTER 5. ANTIMONY;50
11.1;5.1 Absorptiometric Procedure;51
12;CHAPTER 6. ARSENIC;52
12.1;6.1 Distillation/Volumetric Procedure;54
12.2;6.2 Absorptiometric Procedure;55
13;CHAPTER 7. BERYLLIUM;57
13.1;7.1 Gravimetric Procedure;58
13.2;7.2 Absorptiometric Procedure;59
14;CHAPTER 8. BISMUTH;61
14.1;8.1 Absorptiometric Procedure;62
14.2;8.2 Polarographic Procedure;63
15;CHAPTER 9. BORON;67
15.1;9.1 Absorptiometric Procedure;67
16;CHAPTER 10. CADMIUM;69
16.1;10.1 Direct Polarographic Procedure (cadmium greater than0-01 per cent);70
16.2;10.2 Polarographic Procedure (cadmium greater than 0¼01 per cent);70
17;CHAPTER 11. CARBON;72
17.1;11.1 Gravimetric Procedure;73
17.2;11.2 Conductimetric Procedure;75
17.3;11.3 Low-Pressure Procedure;77
18;CHAPTER 12. CHROMIUM;80
18.1;12.1 Absorptiometric Procedure;81
18.2;12.2 Volumetric Procedure;83
18.3;12.3 Polarographic Procedure;84
19;CHAPTER 13. COBALT;85
19.1;13.1 Absorptiometric Procedure;86
19.2;13.2 Atomic-Absorption Procedure;87
20;CHAPTER 14. HYDROGEN;91
20.1;14.1 Vacuum-Extraction Procedure;92
21;CHAPTER 15. IRON;99
21.1;15.1 Volumetric Procedure;101
21.2;15.2 Direct Absorptiometric Procedure;102
21.3;15.3 Absorptiometric Procedure;103
22;CHAPTER 16. LEAD;105
22.1;16.1 Electrolytic Procedure;108
22.2;16.2 Gravimetric Procedure;109
22.3;16.3 Atomic-Absorption Procedure;110
22.4;16.4 Rapid Volumetric Procedure;111
22.5;16.5 Direct Polarographic Procedure (lead greater than 0¼5 per cent);112
22.6;16.6 Polarographic Procedure (lead greater than lOp.p.m.);113
22.7;16.7 Polarographic Procedure (lead greater than 2p.p.m.);114
23;CHAPTER 17. MANGANESE;115
23.1;17.1 Absorptiometric Procedure;116
23.2;17.2 Volumetric Procedure;117
24;CHAPTER 18. MERCURY;118
24.1;18.1 Extractive-Titration Procedure;118
25;CHAPTER 19. NICKEL;122
25.1;19.1 Absorptiometric Procedure;124
25.2;19.2 Gravimetric Procedure;125
25.3;19.3 Volumetric Procedure;126
26;CHAPTER 20. NITROGEN;128
26.1;20.1 Volumetric Procedure (for nitrogen contents above about 200p.p.m.);130
26.2;20.2 Absorptiometric Procedure (for nitrogen contents 10 to 200p.p.m.);131
27;CHAPTER 21. OXYGEN;134
27.1;21.1 Loss In Weight Procedure;136
27.2;21.2 Low-Pressure Procedure;137
27.3;21.3 Vacuum-Fusion Procedure;141
28;CHAPTER 22. PHOSPHORUS;144
28.1;22.1 Direct Absorptiometric Procedure (less than 0 1 per cent of iron and/or nickel present);145
28.2;22.2 Absorptiometric Procedure (more than 0 1 per cent of iron and/or nickel present);146
29;CHAPTER 23. SELENIUM;148
29.1;23.1 Absorptiometric Procedure;148
30;CHAPTER 24. SILICON;151
30.1;24.1 Routine Absorptiometric Procedure;152
30.2;24.2 Absorptiometric Procedure (molybdenum-blue method);153
30.3;24.3 Absorptiometric Procedure (for Silicon contents below 50p.p.m.);155
30.4;24.4 Gravimetric Procedure;156
31;CHAPTER 25. SILVER;157
31.1;25.1 Amperometric-Titration Procedure;157
31.2;25.2 Atomic-Absorption Procedure;160
31.3;25.3 Gravimetric Procedure;161
32;CHAPTER 26. SULPHUR;162
32.1;26.1 Combustion Procedure;163
32.2;26.2 Evolution Procedure;164
33;CHAPTER 27. TELLURIUM;168
33.1;27.1 Absorptiometric Procedure (for tellurium contents 1 p.p.m. to 002 per cent);169
33.2;27.2 Rapid Absorptiometric Procedure (for tellurium contents 0-2 to 2 per cent);171
33.3;27.3 Polarographic Procedure;172
34;CHAPTER 28. TIN;173
34.1;28.1 Routine Turbidimetric Procedure;175
34.2;28.2 Turbidimetric Procedure;176
34.3;28.3 Gravimetric Procedure;178
34.4;28.4 Volumetric Procedure;178
34.5;28.5 Direct Polarographic Procedure;180
34.6;28.6 Polarographic Procedure (for tin contents greater than lOp.p.m.);181
35;CHAPTER 29. TITANIUM;183
35.1;29.1 Absorptiometric Procedure;183
36;CHAPTER 30. ZINC;185
36.1;30.1 Atomic-Absorption Procedure;185
36.2;30.2 Volumetric Procedure;187
37;CHAPTER 31. ZIRCONIUM (AND HAFNIUM);189
37.1;31.1 Gravimetric Procedure;189
38;CHAPTER 32. ATOMIC NUMBERS AND WEIGHTS;191
39;CHAPTER 33. SUPPLIERS OF REAGENTS, APPARATUS, ETC.;193
40;CHAPTER 34. REFERENCES;195
41;INDEX;202