E-Book, Englisch, 384 Seiten, Web PDF
Francombe / Hoffman Physics of Thin Films
1. Auflage 2013
ISBN: 978-1-4831-4493-1
Verlag: Elsevier Science & Techn.
Format: PDF
Kopierschutz: 1 - PDF Watermark
Advances in Research and Development
E-Book, Englisch, 384 Seiten, Web PDF
ISBN: 978-1-4831-4493-1
Verlag: Elsevier Science & Techn.
Format: PDF
Kopierschutz: 1 - PDF Watermark
Physics of Thin Films: Advances in Research and Development, Volume 6 reviews the rapid progress that has been made in research and development concerning the physics of thin films, with emphasis on metallic films. Topics covered include anodic oxide films, thin metal films and wires, and multilayer magnetic films. This volume is comprised of five chapters and begins with a discussion on the dielectric properties and the technique of plasma anodization which are relevant to the applications of anodic oxide films in electronic devices. Conduction, polarization, and dielectric breakdown effects are also considered. The next chapter examines studies on size-dependent electrical conduction in thin metal films and wires, paying particular attention to both classical and quantum size effects and some of the anisotropic characteristics of epitaxial metal films. The reader is then introduced to the optical properties of metal films and interactions in multilayer magnetic films. This text concludes with a chapter that looks at diffusion in metallic films and presents experimental results for phase-forming systems, miscible systems, and lateral diffusion. This monograph will be of value to students and practitioners of physics, especially those interested in thin films.
Autoren/Hrsg.
Weitere Infos & Material
1;Front Cover;1
2;Physics of Thin Films: Advances in Research and Development;4
3;Copyright Page;5
4;Table of Contents;6
5;Contributors to Volume 6;8
6;Preface;10
7;Contents of Previous Volumes;12
8;Chapter 1. Anodic Oxide Films;16
8.1;I. Introduction;17
8.2;II. Introductory Survey of Some General Features of Anodization;18
8.3;III. Theories of the Ionic Conduction Process;28
8.4;IV. Gaseous Anodization;51
8.5;V. Dielectric Properties;66
8.6;ACKNOWLEDGMENTS;88
8.7;REFERENCES;88
9;Chapter 2. Size-Dependent Electrical Conduction in Thin Metal Films and Wires;96
9.1;I. Introduction;96
9.2;II. Theory of Classical Size Effects;97
9.3;III. Experimental Measurements;116
9.4;IV. Quantum Size Effects;152
9.5;ACKNOWLEDGMENT;158
9.6;REFERENCES;158
10;Chapter 3. Optical Properties of Metallic Films;166
10.1;I. Introduction;166
10.2;II. Optical Properties of Metals;167
10.3;III. Formulas for Thin Homogeneous and Isotropic Metallic Films;170
10.4;IV. Very Thin Films;185
10.5;V Anisotropic Films;192
10.6;VI. Measurement of the Optical Parameters of Metallic Films;197
10.7;VII. Specific Optical Properties of Thin Metallic Films;203
10.8;ACKNOWLEDGMENT;217
10.9;REFERENCES;217
11;Chapter 4. Interactions in Multilayer Magnetic Films;220
11.1;I. Introduction;220
11.2;II. Interaction Phenomena;223
11.3;III. Effects of Coupling;265
11.4;IV. Applications of Multilayer Films;306
11.5;V. Conclusions;309
11.6;ACKNOWLEDGMENTS;309
11.7;REFERENCES;310
12;Chapter 5. Diffusion in Metallic Films;316
12.1;I. Introduction;316
12.2;II. Metal Systems;317
12.3;III. Experimental Methods;325
12.4;IV. Experimental Results;330
12.5;V. Conclusions;358
12.6;REFERENCES;361
13;Author Index;364
14;Subject Index;377




