Gao Precision Nanometrology

Sensors and Measuring Systems for Nanomanufacturing
1. Auflage 2010
ISBN: 978-1-84996-254-4
Verlag: Springer
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 354 Seiten, Web PDF

Reihe: Springer Series in Advanced Manufacturing

Precision Nanometrology describes the new field of precision nanometrology, which plays an important part in nanoscale manufacturing of semiconductors, optical elements, precision parts and similar items. It pays particular attention to the measurement of surface forms of precision workpieces and to stage motions of precision machines. The first half of the book is dedicated to the description of optical sensors for the measurement of angle and displacement, which are fundamental quantities for precision nanometrology. The second half presents a number of scanning-type measuring systems for surface forms and stage motions. The systems discussed include: • error separation algorithms and systems for measurement of straightness and roundness, • the measurement of micro-aspherics, • systems based on scanning probe microscopy, and • scanning image-sensor systems. Precision Nanometrology presents the fundamental and practical technologies of precision nanometrology with a helpful selection of algorithms, instruments and experimental data. It will be beneficial for researchers, engineers and postgraduate students involved in precision engineering, nanotechnology and manufacturing.

Zielgruppe

Research

Autoren/Hrsg.

Gao, Wei

Inhaltsverzeichnis

Angle Sensor for Measurement of Surface Slope and Tilt Motion.- Laser Autocollimator for Measurement of Multi-axis Tilt Motion.- Surface Encoder for Measurement of In-plane Motion.- Grating Encoder for Measurement of In-plane and Out-of-plane Motion.- Scanning Multi-probe System for Measurement of Roundness.- Scanning Error Separation System for Measurement of Straightness.- Scanning Micro-stylus System for Measurement of Micro-aspherics.- Large Area Scanning Probe Microscope for Micro-textured Surfaces.- Automatic Alignment Scanning Probe Microscope System for Measurement of 3D Nanostructures.- Scanning Image-sensor System for Measurement of Micro-dimensions.

Über Autor(innen)

Professor Wei Gao received his Bachelor degree in precision instrumentation engineering from Shanghai Jiao Tong University, China in 1986, followed by MS and PhD degrees in precision engineering from Tohoku University, Japan in 1991 and 1994, respectively. He is currently a professor and the director of the Research Center for Precision Nanosystems in the Department of Nanomechanics, Tohoku University. He acted as a visiting professor at the Center for Precision Metrology, University of North Carolina at Charlotte, USA, in 1998. He is an associate editor for Precision Engineering, Journal of the International Society for Precision Engineering and Nanotechnology. He has served as the chair or co-chair of six international conferences and symposiums on measurement held in China, Japan, Hong Kong and the US. He is a member of ASPE, JSPE, JSME and CIRP.

Professor Wei Gao has been working on precision engineering and metrology for about twenty years. He and his group have developed a number of optical sensors and scanning measuring systems for dimensional measurement and precision motion control. Recently, Wei Gao has been focusing his research on a new field of metrology called precision nanometrology, which aims to realize nanometric accuracy in dimensional measurement over a broad measurement range from micrometers to meters.

Professor Wei Gao is the author or co-author of more than 200 scientific articles. He is the chapter author of six books, including two published by Springer. He is the inventor or co-inventor of 45 patents. He has received more than ten academic awards, including the JSPS Award and the JSPS Numada Paper Award from the Japan Society for Precision Engineering, the Award for Young Scientist from the Japan Society of Mechanical Engineers, and the Contribution Award from the International Journal of Precision Engineering and Manufacturing. He has been invited to provide keynote speeches at a number of international conferences and symposiums on measurement.