Goel High-Speed VLSI Interconnections

2. Auflage 2008
ISBN: 978-0-470-16596-6
Verlag: John Wiley & Sons
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)

E-Book, Englisch, Band 1, 432 Seiten, E-Book

Reihe: Wiley Series in Microwave and Optical Engineering

This Second Edition focuses on emerging topics and advances in thefield of VLSI interconnections
In the decade since High-Speed VLSI Interconnections was firstpublished, several major developments have taken place in thefield. Now, updated to reflect these advancements, this SecondEdition includes new information on copper interconnections,nanotechnology circuit interconnects, electromigration in thecopper interconnections, parasitic inductances, and RLC models forcomprehensive analysis of interconnection delays andcrosstalk.
Each chapter is designed to exist independently or as a part of onecoherent unit, and several appropriate exercises are provided atthe end of each chapter, challenging the reader to gain furtherinsight into the contents being discussed. Chapter subjectsinclude:
* Preliminary Concepts
* Parasitic Resistances, Capacitances, and Inductances
* Interconnection Delays
* Crosstalk Analysis
* Electromigration-Induced Failure Analysis
* Future Interconnections
High-Speed VLSI Interconnections, Second Edition is anindispensable reference for high-speed VLSI designers, RF circuitdesigners, and advanced students of electrical engineering.

Autoren/Hrsg.

Goel, Ashok K.

Über Autor(innen)

AShok k. Goel, PhD, is Associate Professor of Electrical Engineering at Michigan Technological University. He is the author of more than thirty journal publications and numerous conference proceedings. His research interests include nanotechnology circuit design, high-speed VLSI interconnections, device physics and modeling, and semiconductor TCAD.