Haasen / Jaffee Amorphous Metals and Semiconductors

Proceedings of an International Workshop, Coronado, California, USA 12-18 May 1985
1. Auflage 2013
ISBN: 978-1-4831-5050-5
Verlag: Elsevier Science & Techn.
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 484 Seiten, Web PDF

Amorphous Metals and Semiconductors contains the proceedings of an international workshop held at Coronado, California, USA on May 12-18, 1985. Organized into five parts, this book first looks into the historical perspective on semiconductors and metals. This book then explains the glass formation, magnetic glasses, and amorphous semiconductors. The mechanical and chemical properties of these materials are also given.

Autoren/Hrsg.

Haasen, P.

Jaffee, R. I.

Inhaltsverzeichnis

1;Front Cover;1
2;Amorphous Metals and Semiconductors;4
3;Copyright page;5
3.1;Table of Contents;10
4;FOREWORD;6
5;DEDICATED;8
6;PART 1: HISTORICAL PERSPECTIVE;14
6.1;CHAPTER 1. POL DUWEZ- AN APPRECIATION OF HIS WORK;15
6.1.1;INTRODUCTION;15
6.1.2;LIQUID QUENCHING TECHNIQUES;15
6.1.3;RAPIDLY QUENCHED CRYSTALLINE ALLOYS;15
6.1.4;AMORPHOUS ALLOYS;18
6.1.5;REFERENCES;20
6.2;CHAPTER 2. A COMMENTARY ON THE RECOGNITION AND CHARACTERIZATION OF THE METALLIC GLASS STATE;22
6.2.1;Abstract;22
6.2.2;Early Views of the Glass State;22
6.2.3;Experience on the Undercooling of Metal Melts and its Import;23
6.2.4;The Discovery of Metallic Glasses;25
6.2.5;Nature of the Metallic Glass State;26
6.2.6;Impurity Effects on the Formation and Stabilization of Metallic Glasses;27
6.2.7;Acknowledgements;31
6.2.8;References;31
6.3;CHAPTER 3. REMARKS ON THE HISTORY OF NON-CRYSTALLINE SEMICONDUCTORS;36
6.3.1;Introduction;36
6.3.2;Early Developments;37
6.3.3;Comments and Reflections;37
6.3.4;Acknowledgements;38
6.3.5;References;39
6.3.6;STRUCTURE;40
6.4;CHAPTER 4. ICOSAHEDRAL ORDER IN UNDERCOOLED LIQUIDS AND METALLIC GLASSES;41
6.4.1;1. INTRODUCTION;41
6.4.2;2. SHORT RANGE ICOSAHEDRAL ORDER;43
6.4.3;REFERENCES;53
6.5;CHAPTER 5. CHEMICAL ORDERING IN METALLIC GLASSES;58
6.5.1;1. Introduction;58
6.5.2;2. Atom probe FIM of metallic glasses;59
6.5.3;3. Results of AB-FIM for various glasses;60
6.5.4;4. Measurement of the chemical potential of a metallic glass relative to one of its crystalline components;62
6.5.5;Acknowledgement;62
6.5.6;References;62
6.5.7;DISCUSSION;66
6.6;CHAPTER 6. DIFFRACTION STUDIES OF CHEMICAL ORDER IN METALLIC GLASSES;67
6.6.1;Introduction;67
6.6.2;Diffraction of Neutrons and X-Rays by Non-Crystalline Alloys;68
6.6.3;Evaluation of the Partial Structure Factors;72
6.6.4;Experimental Results;74
6.6.5;Discussion;78
6.6.6;Acknowledgements;80
6.6.7;References;80
6.6.8;DISCUSSION;81
6.7;CHAPTER 7. QUASICRYSTALS;83
6.7.1;INTRODUCTION;83
6.7.2;BASIC CONCEPTS;84
6.7.3;AMAJOR EXAMPLE—PENROSE TILINGS;84
6.7.4;QUASICRYSTALLOGRAPHY IN 2D AND 3D;87
6.7.5;ICOSAHEDRAL QUASICRYSTALS;90
6.7.6;DIFFRACTION PATTERNS;93
6.7.7;Bibliography;99
6.7.8;DISCUSSION;101
6.8;CHAPTER 8. AGENDA DISCUSSION ON STRUCTURE;103
7;PART 2: GLASS FORMATION;106
7.1;CHAPTER 9. CRYSTAL NUCLEATION AND GROWTH IN METALLIC LIQUIDS AND GLASSES;107
7.1.1;1. INTRODUCTION;107
7.1.2;2. THEORY;109
7.1.3;3. ANALYSIS OF CRYSTALLISATION KINETICS;113
7.1.4;4. QUANTITATIVE PREDICTIONS OF GLASS FORMABILITY;114
7.1.5;5. OUTSTANDING PROBLEMS;117
7.1.6;ACKNOWLEDGEMENTS;117
7.1.7;REFERENCES;118
7.1.8;DISCUSSION;119
7.2;CHAPTER 9. ATOMIC MIGRATION IN METALLIC GLASSES;121
7.2.1;Abstract;121
7.2.2;Introduction;121
7.2.3;Structural Relaxation;121
7.2.4;Scaling to the Glass Transition Temperature;123
7.2.5;Diffusion Barrier Layers;126
7.2.6;Crystallisation;128
7.2.7;Random Walks;130
7.2.8;Interstitial Diffusion and Hydrogen in Metallic Glasses;132
7.2.9;Defects in Metallic Glasses;132
7.2.10;Acknowledgements;136
7.2.11;References;136
7.2.12;DISCUSSION;137
7.3;CHAPTER 10. GLASS TRANSITION AND SECONDARY RELAXATION IN METAL GLASSES;139
7.3.1;INTRODUCTION;139
7.3.2;INTERNAL FRICTION MEASUREMENTS;140
7.3.3;ENTHALPY RELAXATION;144
7.3.4;A PHENOMELOGICAL MODEL;148
7.3.5;ENTHALPY RELAXATION SPECTRUM;153
7.3.6;IMPLICATIONS;158
7.3.7;REFERENCES;161
7.3.8;DISCUSSION;163
7.4;CHAPTER 11. ELECTRONIC ASPECTS OF THE STRUCTURE AND OF THE GLASS-FORMING ABILITY OF METALLIC ALLOYS;164
7.4.1;Introduction;164
7.4.2;2. Interatomic Forces in Metals and Alloys;165
7.4.3;3. From the interatomic force law to the atomic structure;168
7.4.4;4. Interatomic forces and ordering;171
7.4.5;5. Phase diagram and glass transition;175
7.4.6;6. Conclusions;178
7.4.7;References;179
7.4.8;DISCUSSION;180
7.5;CHAPTER 12. Metallic Glass Foraation by Solid State Diffusion Reactions;181
7.5.1;Metallic glasses;181
7.5.2;II. Criteria for Transformation of Crvstalline Metals to the Glassv State;181
7.5.3;III. Rgactjgn of Hydrogen with Crystalling Zr3RH;181
7.5.4;IV. Glass Formation in Thin Film Diffusion Multilaver Diffusion Couples of Two Metals;184
7.5.5;V. Extgnsions to Three Dimensional Composites and Future Prospects;188
7.5.6;Acknowledgement;189
7.5.7;DISCUSSION;190
7.6;CHAPTER 13. ON THE GLASS FORMING ABILITY OF METALLIC ALLOYS;191
7.6.1;References;199
7.6.2;DISCUSSION;199
7.7;CHAPTER 14. Agenda Discussion;201
7.7.1;Comment on Glass Transition;201
7.7.2;References;205
8;PART 3: MAGNETIC GLASSES;208
8.1;CHAPTER 15. HIGH FREQUENCY MAGNETIC PROPERTIES AND MAGNETIC STABILITY OF METALLIC GLASSES;209
8.1.1;Introduction;209
8.1.2;High Frequency Properties;209
8.1.3;Model To Describe Magnetic Stability;213
8.1.4;Acknowledgement;215
8.1.5;References;215
8.2;CHAPTER 16. MOMENTS AND ELECTRONIC STRUCTURE OF FERROMAGNETIC AMORPHOUS ALLOYS;217
8.2.1;Introduction;217
8.2.2;The Generalized Slater-Pauling Construction;217
8.2.3;The sp-d Hybridization Gap;218
8.2.4;Application to Amorphous Systems;220
8.2.5;Relation to Charge Transfer Model;222
8.2.6;Relation, to Other Measurements;223
8.2.7;Acknowledgments;224
8.2.8;References;224
8.3;CHAPTER 17. MAGNETIC DOMAINS, ANISOTROPIES, AND PROPERTIES OF AMORPHOUS METALS;225
8.3.1;INTRODUCTION;225
8.3.2;MAGNETIC ANISOTROPIES;225
8.3.3;LONGITUDINAL ANISOTROPY;227
8.3.4;TRANSVERSE ANISOTROPY;227
8.3.5;PERPENDICULAR ANISOTROPY;228
8.3.6;STUDYING STRESSES VIA DOMAIN OBSERVATIONS;228
8.3.7;AMORPHOUS FILMS;229
8.3.8;ACKNOWLEDGMENTS;230
8.3.9;REFERENCES;230
8.4;CHAPTER 18. STRUCTURAL RELAXATION PHENOMENA IN AMORPHOUS ALLOYS;235
8.4.1;Introduction;235
8.4.2;Classification of the Relaxation Phenomena;235
8.4.3;Kinetics of Group I Relaxation Phenomena;237
8.4.4;Group II Relaxation Phenomena; Kinetics of Ku and Tc;238
8.4.5;Internal Friction;243
8.4.6;Relationship among Ku, Tc and Q -1;244
8.4.7;Kinetics of the Change in the Activation Energy Spectrum;245
8.4.8;structural Change Due to Anelastic Polarization;247
8.4.9;Microscopic Mechanism of Structural Relaxation;250
8.4.10;Conclusions;251
8.4.11;Acknowledgements;252
8.4.12;References;252
8.5;CHAPTER 19. LOCAL ATOMIC ORDER AND MAGNETIC PROPERTIES OF NON-CRYSTALLINE ALLOYS;254
8.5.1;Introduction;254
8.5.2;Investigative Techniques;256
8.5.3;Structural Transformation;259
8.5.4;Quasi-crystals;265
8.5.5;Implications for Magnetism;268
8.5.6;Summary;270
8.5.7;References;271
8.6;CHAPTER 20. THE ROLE OF ATOMIC, MAGNETIC DOUBLE-WELL SYSTEMS IN AMORPHOUS ALLOYS;272
8.6.1;1. Introduction;272
8.6.2;2. Some Basic Experimental Results;272
8.6.3;3. Remarks on Defect Structures in Amorphous Alloys;275
8.6.4;4. The Model of Atomic Double-Well Systems;275
8.6.5;References;281
8.6.6;DISCUSSION;282
8.7;CHAPTER 21. Agenda Discussion;283
9;PART 4: AMORPHOUS SEMICONDUCTORS;290
9.1;CHAPTER 22. DOPANT AND DEFECT STATES IN AMORPHOUS SILICON;291
9.1.1;INTRODUCTION;291
9.1.2;DEEP LOCALIZED STATES;292
9.1.3;SHALLOW LOCALIZED STATES;298
9.1.4;A MODEL FOR DOPING;299
9.1.5;SUMMARY;300
9.1.6;ACKNOWLEDGEMENTS;301
9.1.7;REFERENCES;301
9.2;CHAPTER 23. COMPOSITIONALLY MODULATED AMORPHOUS SEMICONDUCTOR SUPERLATTICES;302
9.2.1;1. Introduction;302
9.2.2;2. Film Deposition;302
9.2.3;3. Structure of Interfaces;303
9.2.4;4. Optical Bandgap in a-Si:H/a-Ge:H;307
9.2.5;5. Electrical Resistivity in a-Si:H/a-Ge:H;307
9.2.6;6. Summary and Conclusions;308
9.2.7;References;309
9.2.8;DISCUSSION;310
9.3;CHAPTER 24. MICROSTRUCTURE CONSIDERATIONS IN HYDROGENATED AMORPHOUS SILICON THIN FILMS;312
9.3.1;INTRODUCTION;312
9.3.2;DEPOSITION PROCESSES;312
9.3.3;SUBSTRATE REACTIONS;315
9.3.4;ION BOMBARDMENT;318
9.3.5;SUMMARY;323
9.3.6;References;323
9.3.7;DISCUSSION;325
9.4;CHAPTER 25. EFFECT OF THE SURFACE ON THE PROPERTIES OF AMORPHOUS SEMICONDUCTORS;328
9.4.1;Introduction;328
9.4.2;Adsorbates and Over!ayers;329
9.4.3;Measurements in Ultra High Vacuum;331
9.4.4;Metastable Conductance Changes;332
9.4.5;Dangling Bonds at Interfaces and Effects of Stress;334
9.4.6;Conclusions;335
9.4.7;Acknowledgements;335
9.4.8;DISCUSSION;336
9.5;CHAPTER 26. STRUCTURAL ISSUES IN AMORPHOUS CHALCOGENIDES;338
9.5.1;1. INTRODUCTION;338
9.5.2;2. STRUCTURAL ISSUES;339
9.5.3;3. THE CASE OF GeS2;340
9.5.4;4. SOLVENT-DEPOSITED As-S FILMS;344
9.5.5;REFERENCES;344
9.5.6;DISCUSSION;345
9.6;CHAPTER 27. ALLOYS OF AMORPHOUS HYDROGENATED SILICON;347
9.6.1;Abstract;347
9.6.2;1. Introduction;347
9.6.3;2. Alloys with C, Ge, Sn and N;348
9.6.4;3. Preparation of a-Si,Ge:H,F Alloys;349
9.6.5;4. Properties of the Alloy Films;353
9.6.6;5. Interfaces Between Alloys of Qf-Si:H;355
9.6.7;List of References;362
9.6.8;DISCUSSION;363
9.7;CHAPTER 28. AGENDA DISCUSSION ON AMORPHOUS SEMICONDUCTORS;364
10;PART 5: MECHANICAL AND CHEMICAL PROPERTIES;366
10.1;CHAPTER 29. DEFECT MODIFICATIONS OF AMORPHOUS STRUCTURES;367
10.1.1;Abstract;367
10.1.2;Introduction;367
10.1.3;Point Defects;367
10.1.4;Atomic Motions in Deformation;372
10.1.5;Line Defects;373
10.1.6;Acknowledgement;375
10.1.7;References;375
10.2;CHAPTER 30. CREEP AND BRITTLE FRACTURE OF METALLIC GLASSES;378
10.2.1;Abstract;378
10.2.2;1. Introduction;378
10.2.3;2. Viscosity;379
10.2.4;3. Brittle Fracture;385
10.2.5;Acknowledgements;389
10.2.6;References;389
10.2.7;DISCUSSION;390
10.3;CHAPTER 31. PROBING BY ANELASTIC AND PLASTIC DEFORMATION THE STRUCTURE OF METALLIC GLASSES UNDERGOING AGING AND EMBRITTLEMENT;392
10.3.1;I. Introduction;392
10.3.2;II. Atomic Struoture of Metallic Glasses;392
10.3.3;III, Plastic Flew by Shear Transformations;393
10.3.4;IV. Kinetics of Quasi-Homogeneous Inelastic Shear Flow;394
10.3.5;V. Shear Localization Into Bands;395
10.3.6;VI. Activation Parameters of Shear Relaxations and the Effect of Aging on Them;396
10.3.7;VII. Spectra For Distributions of Relaxation Times;397
10.3.8;VIII. Changes in Plastio Resistance and Strain to Fracture on Aging;400
10.3.9;IX. Disoussion;401
10.3.10;Acknowledgement;402
10.3.11;Referenoes;402
10.3.12;DISCISSION;409
10.4;CHAPTER 32. Atomic Models of Defomation Processes in Liquids and Metallic Glasses;411
10.4.1;1. Introduction;411
10.4.2;2. Atomistic Modeling of Glasses and Liquids;413
10.4.3;3. Description of the local atomic structure and defects in amorphous materials;414
10.4.4;4. Viscosity and Diffusion in Supercooled Liquids;416
10.4.5;5. Hign temperature diffusional creep in glasses;418
10.4.6;6. Deformation at high stresses;419
10.4.7;7. Conclusions;422
10.4.8;Acknowledgements;423
10.4.9;References;423
10.4.10;DISCUSSION;425
10.5;CHAPTER 33. CORROSION RESISTANCE OF METASTABLE ALLOYS PROCESSED BY RAPID SOLIDIFICATION;426
10.5.1;INTRODUCTION;426
10.5.2;PHENOMENOLOGY;426
10.5.3;MECHANISTICS;437
10.5.4;ACKNOWLEDGEMENTS;441
10.5.5;REFERENCES;441
10.5.6;DISCUSSION;442
10.6;CHAPTER 34. CATALYTIC PROPERTIES OF AMORPHOUS ALLOYS;444
10.6.1;1. Catalyst;444
10.6.2;2. Electrode;444
10.7;CHAPTER 34. AMORPHOUS METALLIC HYDRIDES : A BIASED VIEW OF RECENT PROGRESS;448
10.7.1;I - INTRODUCTION;448
10.7.2;II - ELECTRONIC STRUCTURE : FROM CRYSTALLINE TO AMORPHOUS METALLIC HYDRIDES;450
10.7.3;III - STRUCTURE OF GLASSY METAL HYDRIDES;456
10.7.4;IV - TRANSLATIONAL MOTION IN GLASSY METAL HYDRIDES;463
10.7.5;V - AMORPHOUS METALLIC HYDRIDE FORMATION;466
10.7.6;VI - ELECTRONIC PROPERTIES;469
10.7.7;VII - SUMMARY AND CONCLUSIONS;474
10.7.8;REFERENCES;475
10.8;CHAPTER 35. Agenda Discussion: Mechanical and Chemical Properties;478
11;PARTICIPANTS;482
12;INDEX OF AUTHORS;484