E-Book, Englisch, 272 Seiten
Insepov Cluster Ion-Solid Interactions
Erscheinungsjahr 2016
ISBN: 978-1-4398-7543-8
Verlag: CRC Press
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
Theory, Simulation, and Experiment
E-Book, Englisch, 272 Seiten
ISBN: 978-1-4398-7543-8
Verlag: CRC Press
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
An important tool for nanoscale material processing, gas cluster ion beam (GCIB) technology uses charged cluster ions for modifying surfaces. Co-authored by the inventor of this technology, this book gives a balanced treatment of the theory, simulation methods, experimental techniques, and emerging applications. The authors discuss the impact of GCIB technology on the semiconductor industry, including its use in shallow junction formation, etching and smoothing of semiconductors, assisted formation of thin films with nanoscale accuracy, and other surface modification applications.
Zielgruppe
Scientists and engineers in materials science, applied physics, optics, electronics, and nanotechnology; industry professionals working in optical/magnetic or semiconductor companies; advanced undergraduate and graduate students in ion beam engineering, nanoelectronics, and solid state physics.
Autoren/Hrsg.
Fachgebiete
Weitere Infos & Material
THEORY: Cluster Formation in Gases. Cluster Formation in Rarefied Gas Flow. Cluster Formation in Dense Systems: Absorbents. Cluster Formation in Fluids, Solids, and Nuclear Materials. Cluster Ion-Solid Surface Interaction Kinetics. Cluster Ion Beam Sputtering. Cluster Ion Implantation. Cluster Ion Beam-Assisted Deposition. METHODS AND APPLICATIONS: Cluster Ion Beam Equipment. Cluster Ion-Solid Surface Interaction Kinetics. Cluster Ion Beam Sputtering. Cluster Ion Implantation. Cluster Ion Beam-Assisted Deposition. Applications.
