Molokovsky / Sushkov Intense Electron and Ion Beams

1. Auflage 2005
ISBN: 978-3-540-28812-1
Verlag: Springer Berlin Heidelberg
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 281 Seiten

Intense Ion and Electron Beams treats intense charged-particle beams used in vacuum tubes, particle beam technology and experimental installations such as free electron lasers and accelerators. It addresses, among other things, the physics and basic theory of intense charged-particle beams; computation and design of charged-particle guns and focusing systems; multiple-beam charged-particle systems; and experimental methods for investigating intense particle beams. The coverage is carefully balanced between the physics of intense charged-particle beams and the design of optical systems for their formation and focusing. It can be recommended to all scientists studying or applying vacuum electronics and charged-particle beam technology, including students, engineers, and researchers.

Autoren/Hrsg.

Molokovsky, Sergey Ivanovich

Sushkov, Aleksandr Danilovich

Inhaltsverzeichnis

1;Preface;5
2;Contents;7
3;1 Introduction to Particle-Beam Formation;13
3.1;1.1 Application and Parameters of Intense Charged- Particle Beams;13
3.2;1.2 Optical Systems of Electron Devices;16
3.3;1.3 Focusing System of Electron Devices;21
3.4;1.4 Optical Systems of Particle-Beam Technology;26
3.5;1.5 Ion Optical Systems;28
4;2 Methods of Fields Calculation;30
4.1;2.1 General Equations of Electrostatic Fields;30
4.2;2.2 Electrostatic Field Calculation. Dirichlet Problem;31
4.3;2.3 Calculation of Electrostatic Field: Cauchy Problem;41
4.4;2.4 Computer Calculation of Electrostatic Fields;47
4.5;2.5 General Equations of Magnetic Field;54
4.6;2.6 Numerical Calculation of Magnetic Field;58
5;3 Fundamentals of Charged-Particle Motion;65
5.1;3.1 Equations of Motion in Newton Form;65
5.2;3.2 Law of Energy Conservation;66
5.3;3.3 Lagrange Equations of Motion;68
5.4;3.4 Hamilton Equations;69
5.5;3.5 Hamilton–Jacobi Equation;70
5.6;3.6 Equations of Motion in Axially Symmetric Fields;72
5.7;3.7 Motion in Planar Two-Dimensional Fields;83
5.8;3.8 Numerical Calculation of Charged- Particle Trajectories;84
5.9;3.9 Electrostatic Charged-Particle Lenses;87
5.10;3.10 Magnetic Lenses;96
6;4 Motion of Intense Charged-Particle Beams;105
6.1;4.1 Peculiarities of Intense Particle-Beam Motion;105
6.2;4.2 Simplified Models of Charged-Particle Beams;108
6.3;4.3 Methods of Solution of Motion Equations;112
6.4;4.4 Approximate Method of Space-Charge Account;115
6.5;4.5 Motion of Charge-Beams in Channels Free from External Fields;117
6.6;4.6 Influence of Residual Gases on Electron- Beam Motion;120
6.7;4.7 Estimation of Effect of Thermal Electron Velocities;127
6.8;4.8 Methods of Solution of Self-Consistent Problems;131
7;5 Electron Guns;134
7.1;5.1 The Problem of Electron-Beam Formation;134
7.2;5.2 Guns for Formation of Strip Beams;135
7.3;5.3 Guns for Solid Axially Symmetric Beams;142
7.4;5.4 Guns for Formation of Hollow Axisymmetric Beams;150
7.5;5.5 Electron Guns with Beam-Current Control;154
7.6;5.6 Principle of Computer-Aided Design of Electron Guns;160
8;6 Electron and Ion Sources with Field and Plasma Emitters;165
8.1;6.1 Some Peculiarities of Field and Plasma Emitters;165
8.2;6.2 Low-Current Field-Emission Guns;165
8.3;6.3 Multiple-Tip Field-Emission Cathodes;167
8.4;6.4 High-Current Electron Sources with Explosive Emission;168
8.5;6.5 Liquid-Metal Emitters;168
8.6;6.6 Plasma Sources of Charged Particles;169
8.7;6.7 Extracting of Charge Particles and Beam Forming;173
9;7 Magnetic Focusing Systems;176
9.1;7.1 Focusing Systems with Uniform Field;176
9.2;7.2 Systems of Reversed- and Periodic-Field Focusing;188
9.3;7.3 Focusing of Hollow Beams in Uniform Field;195
9.4;7.4 Focusing of Strip Beams;200
9.5;7.5 Computer-Aided Design of Magnetic Systems;203
10;8 Electrostatic Focusing Systems;205
10.1;8.1 Focusing System for Solid Axially Symmetrical Beams;205
10.2;8.2 Systems for Focusing of Strip Beams;216
10.3;8.3 Focusing Systems for Hollow Beams;217
11;9 Optical Systems of Technological Installations;220
11.1;9.1 Electron Probe of Welding Installation;220
11.2;9.2 Optical System for Electron-Beam Lithography;224
11.3;9.3 Ion Probes;226
12;10 Intense Relativistic Charged- Particle Beams;228
12.1;10.1 Relativistic Equations of Motion;228
12.2;10.2 Intense Relativistic Beams in Vacuum Channels;230
12.3;10.3 Neutralized Relativistic Beams;237
12.4;10.4 Beam-Motion Computation;237
13;11 Multiple-Beam Electron-Optical Systems;242
13.1;11.1 Peculiarities and Application of Multiple Beams;242
13.2;11.2 Multiple-Beam Guns and Magnetic Systems;244
13.3;11.3 Peculiarities of Multiple Systems;248
13.4;11.4 Estimation of Effects of Transverse Fields;253
13.5;11.5 Analysis of Beam Interaction;255
14;12 Methods of Experimental Investigation of Beams;260
14.1;12.1 Classification of Methods;260
14.2;12.2 The Pin-Hole Chamber Method;263
14.3;12.3 Application of Modified Pin-Hole Chamber;266
15;Appendix;270
15.1;Emittance and Brightness;270
16;References;274
17;Index;283