E-Book, Englisch, 459 Seiten
Shibkov ESD Design for Analog Circuits
1. Auflage 2010
ISBN: 978-1-4419-6565-3
Verlag: Springer-Verlag
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
E-Book, Englisch, 459 Seiten
ISBN: 978-1-4419-6565-3
Verlag: Springer-Verlag
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
Autoren/Hrsg.
Weitere Infos & Material
1;Preface;6
1.1;This Book and Simulation Software Bundle Project;6
1.2;Subject and Purpose of This Book;7
1.3;The Book Structure;8
2;Acknowledgments;11
3;Contents;13
4;1 Introduction;19
4.1;1.1 Analog and Digital in Prism of ESD Design;19
4.2;1.2 Important Definitions;22
4.2.1;1.2.1 ESD Protection Network;22
4.2.2;1.2.2 ESD Clamps;24
4.2.3;1.2.3 Absolute Maximum Limits and Pulsed SOA;25
4.2.4;1.2.4 ESD Pulse Specification;26
4.2.5;1.2.5 Breakdown and Instability;27
4.3;DECIMM TM Simulation Examples for Introduction ;32
5;2 Conductivity Modulation in Semiconductor Structures Under Breakdown and Injection;33
5.1;2.1 Important Definitions and Limitations;33
5.1.1;2.1.1 Basic Semiconductor Structures;33
5.1.2;2.1.2 Conductivity Modulation and Negative Differential Resistance;35
5.1.3;2.1.3 Spatial Current Instability, Filamentation, and Suppression;36
5.1.4;2.1.4 Snapback Operation;38
5.1.5;2.1.5 Notes to the Methodology of Material Presentation in This Chapter;40
5.2;2.2 Avalanche Breakdown in Reverse-Biased pn Structure;41
5.2.1;2.2.1 Analytical Description of the Avalanche Breakdown Phenomenon;42
5.2.2;2.2.2 Numerical Analysis of the Avalanche Breakdown in the p + 0p0n + Structure p + -p-n + structure ;44
5.3;2.3 Double-AvalancheInjection in pin Structures;48
5.3.1;2.3.1 An Analytical Description of the Effect;48
5.3.2;2.3.2 Numerical Analysis for the p--i--n Diode Structure;49
5.4;2.4 AvalancheInjection in Si n + nn + Diode Structure;51
5.4.1;2.4.1 Analytical Approach;52
5.4.2;2.4.2 Simulation Analysis;54
5.5;2.5 Conductivity Modulation Instability in npn Diode Structures;55
5.5.1;2.5.1 Conductivity Modulation in a Floating Base Region: Diode Operation Mode;55
5.5.1.1;2.5.1.1 The Case of Floating Base Breakdown (BVCEO) I B = 0;55
5.5.1.2;2.5.1.2 Numerical Solution for I B = 0 Case;57
5.6;2.6 Conductivity Modulation in the Triode npn Structure;58
5.6.1;2.6.1 The Case of Grounded Base Breakdown Operation U EB = 0 (BVCES);58
5.6.2;2.6.2 The Floating Emitter Case I E =0;59
5.6.3;2.6.3 Avalanche-Injection in a Common Emitter Circuit: The Case of I B< 0 Regime;59
5.6.3.1;2.6.3.1 Numerical Analysis for I B < 0 Case;62
5.6.4;2.6.4 Avalanche-Injection in the Common Emitter Circuit with Positive Base Current IB> 0;65
5.6.4.1;2.6.4.1 Analytical Description of the I B > 0 Case;66
5.6.4.2;2.6.4.2 Numerical Analysis of the I B > 0 Case;67
5.6.5;2.6.5 Avalanche--Injection in the Common Base Circuit;69
5.7;2.7 AvalancheInjection in PNP Structures;70
5.8;2.8 Double Injection in Si pnpn Structures;71
5.8.1;2.8.1 Equivalent Circuit;71
5.8.2;2.8.2 Simulation of Conductivity Modulation in p--n--p--n Structures;74
5.8.2.1;2.8.2.1 Floating Base Case;74
5.8.2.2;2.8.2.2 Connected Base Case;76
5.9;2.9 Spatial Current Instability Phenomena in Semiconductor Structures with Negative Differential Resistance;77
5.9.1;2.9.1 Current Filamentation at Avalanche--Injection;78
5.9.2;2.9.2 Current Filamentation Effect in Double-Avalanche--Injection Conductivity Modulation;81
5.9.3;2.9.3 Current Filamentation Effect in the Case of Double Injection;84
5.10;2.10 Summary;84
5.11;DECIMM TM Simulation Examples DECIMM TM Simulation examples for Chapter 2 ;86
6;3 Standard and ESD Devices in Integrated Process Technologies;87
6.1;3.1 ESD Specifics in Integrated Process Technology;88
6.1.1;3.1.1 Typical DGO CMOS Process with Extended Voltage Components;88
6.1.1.1;3.1.1.1 Initial Wafer Material;89
6.1.1.2;3.1.1.2 Device Isolation;90
6.1.1.3;3.1.1.3 Deep Nwell isolation;91
6.1.1.4;3.1.1.4 Well Implants;93
6.1.1.5;3.1.1.5 Gate Oxide;94
6.1.1.6;3.1.1.6 Polygate;94
6.1.1.7;3.1.1.7 Lightly Doped Drain Implants;96
6.1.1.8;3.1.1.8 Spacer Formation and NPLUS and PPLUS Implants;97
6.1.1.9;3.1.1.9 Activation and Silicidation;98
6.1.1.10;3.1.1.10 Contacts and Backend;100
6.1.2;3.1.2 ESD Specific for BCD and BiCMOS Integrated Process Flow;101
6.1.2.1;3.1.2.1 Generic Process Flow;101
6.1.2.2;3.1.2.2 Subcollector and Substrate Isolation Regions;102
6.1.2.3;3.1.2.3 Isolation BCD Process Steps;104
6.1.2.4;3.1.2.4 Collector and Initial CMOS Regions;104
6.2;3.2 Safe Operating Area in ESD Pulse Regime;105
6.2.1;3.2.1 SOA and Current Instability Boundary in Reliability;106
6.2.2;3.2.2 Pulsed SOA for ESD Regimes;108
6.2.2.1;3.2.2.1 Standard Devices;109
6.2.3;3.2.3 ESD SOA for Typical Devices in BCD Process;110
6.2.3.1;3.2.3.1 Waveform SOA Measurements;113
6.2.4;3.2.4 Instability Boundary and SOA for ESD devices;114
6.2.5;3.2.5 Physical Limitation of ESD Devices. Spatial Thermal Runaway;116
6.3;3.3 Low-Voltage ESD Devices in CMOS Processes;120
6.3.1;3.3.1 Snapback NMOS;121
6.3.1.1;3.3.1.1 Three-Dimensional Simulation of Current Instability in Snapback NMOS Devices;122
6.3.2;3.3.2 FOX (TFO) ESD device;123
6.3.2.1;3.3.2.1 Surface NPN;125
6.3.3;3.3.3 LVTSCR and FOXSCR;127
6.3.4;3.3.4 Low-Voltage Avalanche Diodes;129
6.3.4.1;3.3.4.1 Comparison of the Surface and Buried Avalanche Diodes;130
6.4;3.4 ESD Devices in BJT Processes;130
6.4.1;3.4.1 Integrated NPN BJT Devices;132
6.4.2;3.4.2 Bipolar SCR;134
6.5;3.5 High-Voltage ESD Devices in BCD and Extended Voltage CMOS Processes;135
6.5.1;3.5.1 LDMOS-SCR and DeMOS-SCR Devices;136
6.5.2;3.5.2 Lateral PNP BJT Devices;139
6.5.3;3.5.3 High-Voltage Avalanche Diodes;144
6.6;3.6 Dual Direction Devices;145
6.6.1;3.6.1 Dual-Direction Device Architecture in CMOS Process;146
6.6.1.1;3.6.1.1 Device-Level Positive and Negative Feedback;147
6.6.2;3.6.2 High-Voltage Dual-Direction Devices;149
6.6.3;3.6.3 Dual Direction ESD Devices Based upon Si--Ge NPN BJT Structure;152
6.6.3.1;3.6.3.1 Experimental Characteristics of the DD-BJT Cl155
6.7;3.7 ESD Diodes and Passive Components;157
6.7.1;3.7.1 Forward-Biased ESD Diodes;157
6.7.1.1;3.7.1.1 CMOS Diodes CMOS diodes ;158
6.7.1.2;3.7.1.2 Gated Diodes Gated diodes ;159
6.7.2;3.7.2 Passives;160
6.7.2.1;3.7.2.1 Saturation Resistors Saturation resistors [ 59 ];161
6.7.2.2;3.7.2.2 Thin Film Resistors;164
6.8;3.8 Summary;165
6.9;DECIMM TM Simulation Examples for Chapter 3 ;166
6.9.1;Example 3.1 Standard Devices in BCD Process Technology;167
6.9.2;Example 3.2 Typical ESD Devices in 0.5 m BCD Process Technology;168
6.9.3;Example 3.3 Ring Oscillators;171
7;4 ESD Clamps;173
7.1;4.1 Active NMOS Cl176
7.2;4.2 Low-Voltage Clamps with Internal Blocking Junction Reference or d V /d t Turn-on;179
7.2.1;4.2.1 Snapback NMOS Clamps;179
7.2.1.1;4.2.1.1 Ground-Referenced Snapback NMOS;179
7.2.1.2;4.2.1.2 Gate Coupling;179
7.2.1.3;4.2.1.3 Displacement Current Effect;180
7.2.1.4;4.2.1.4 Reverse Path Protection;182
7.2.1.5;4.2.1.5 Isolated Snapback NMOS Isolated Snapback NMOS ;182
7.2.1.6;4.2.1.6 The 40 Rule for Backend;184
7.2.2;4.2.2 Transient-Triggered PMOS Cl185
7.2.3;4.2.3 100V FOX Snapback Device FOX Snapback device ;187
7.2.4;4.2.4 LVTSCR and FOX-SCR Clamps;189
7.2.5;4.2.5 High Holding Voltage LVTSCR Clamps;190
7.2.5.1;4.2.5.1 High Holding Voltage Cell Topology;190
7.2.5.2;4.2.5.2 Clamp-Level High Holding Voltage Using P-Emitter De-biasing;192
7.2.6;4.2.6 Triggering Characteristics Control in SCR Clamps;194
7.2.6.1;4.2.6.1 Mixed Device-Circuit Concept;195
7.2.6.2;4.2.6.2 Practical Implementation of the Concept for the Case of 130 nm Process ;195
7.2.6.3;4.2.6.3 Principle of Dual-Base Control Operation;196
7.2.6.4;4.2.6.4 Pulsed Characterization of Dual-Base Control (DBC) Cl198
7.2.6.5;4.2.6.5 DC Leakage of DBC Cl199
7.3;4.3 Voltage and Current Reference in ESD Cl200
7.3.1;4.3.1 Low-Voltage Clamps in BiCMOS process technology;201
7.3.2;4.3.2 NPN Clamps with Voltage Reference;203
7.4;4.4 High-Voltage ESD Devices;206
7.4.1;4.4.1 20 V NPN with Blocking Junction Internal Reference;207
7.4.2;4.4.2 NPN Clamp with External Lateral Avalanche Diode Reference;208
7.4.3;4.4.3 SCR-Based High-Voltage Cl208
7.4.4;4.4.4 Lateral LPNP Cl208
7.4.5;4.4.5 Mixed Device-Circuit Dual Mode Solutions;209
7.4.5.1;4.4.5.1 Example of Circuit Design;210
7.5;4.5 The Concept of Self-Protection;214
7.5.1;4.5.1 Device-Level Self-Protection;214
7.5.2;4.5.2 Array-Level Protection;216
7.6;4.6 ESD Protection of Ultra High Voltage Circuits;218
7.7;4.7 Summary;221
7.8;DECIMMTM Simulation Examples for Chapter 4;222
7.8.1;Example 4.1 Snapback NMOS Clamp Operation Analysis;222
7.8.2;Example 4.2 LVTSCR ESD Clamps;223
7.8.3;Example 4.3 Two-Stage ESD Protection with Snapback NMOS;224
7.8.4;Example 4.4 High-Voltage NLDMOS-SCR Clamp with High-Side Avalanche Diode Reference;225
7.8.5;Example 4.5 PNP Clamp with Low Side Avalanche Diode Reference;226
7.8.6;Example 4.6 High-Voltage NPN Cl227
7.8.7;Example 4.7 Bipolar SCR ESD Cl228
7.8.8;Example 4.8 Diode-Triggered SCR ESD Cl229
8;5 ESD Network Design Principles;231
8.1;5.1 Rail-Based ESD Protection Network;233
8.1.1;5.1.1 Rail Based and Local ESD Protection;233
8.1.2;5.1.2 Rail-Based ESD Protection Using Snapback Clamps;235
8.1.3;5.1.3 Rail-Based ESD Protection Using Active Clamps;237
8.1.4;5.1.4 Specific of Active Clamp Design in BiCMOS Processes;241
8.1.4.1;5.1.4.1 Verification by Circuit Simulation;241
8.1.4.2;5.1.4.2 Experimental Comparison;243
8.1.4.3;5.1.4.3 Active Clamp Protection in Complementary BiCMOS with Low-Voltage CMOS Components;245
8.1.5;5.1.5 Bipolar Differential Input Protection;250
8.1.6;5.1.6 Bipolar Output Protection;252
8.1.7;5.1.7 CMOS Input and Output Protection;253
8.1.8;5.1.8 Array-Level Consideration;255
8.1.9;5.1.9 Concept of Two-Stage Protection;258
8.1.9.1;5.1.9.1 CMOS Input CMOS Input ;258
8.1.9.2;5.1.9.2 Diode-Based Compact Two-Stage ESD Protection Circuit;259
8.1.9.3;5.1.9.3 Two-Stage ESD Protection Circuit for BJT Base;261
8.1.9.4;5.1.9.4 Two-Stage Network with Snapback NMOS;262
8.2;5.2 Local Clamp-Based ESD Protection Network;265
8.2.1;5.2.1 Local ESD Protection;265
8.2.2;5.2.2 Serial Data Line Pin Case Study;266
8.2.3;5.2.3 Erase Pin Protection in EEPROM;268
8.2.4;5.2.4 Local Protection of the Internal Pins;271
8.2.5;5.2.5 Local Protection of the High-Speed I/O pins;274
8.3;5.3 ESD Network for Multiple Voltage Domains;276
8.3.1;5.3.1 Multiple Voltage Domains;276
8.3.2;5.3.2 Protection of Multiple Voltage Domains with Single Active Clamp Network;278
8.3.3;5.3.3 Local Bi-directional ESD Protection of Differential Input;279
8.4;5.4 ESD Network Simulation with ESD Compact Models;281
8.4.1;5.4.1 Compact Model for Snapback NMOS and PMOS Devices;281
8.4.2;5.4.2 Snapback LVTSCR Model;283
8.4.3;5.4.3 Extended Voltage Snapback Compact Models;283
8.4.4;5.4.4 High-Voltage Open Drain Circuit Analysis;288
8.5;5.5 Summary;290
8.6;DECIMM TM Simulation Examples for Chapter 5 ;290
8.6.1;Example 5.1 Active 5 V NMOS Cl290
8.6.2;Example 5.2 Active 5 V PMOS Cl291
8.6.3;Example 5.3 EEPROM Erase pin Protection;292
8.6.4;Example 5.4 BJT-Based Active Clamps;293
8.6.5;Example 5.5 Stacked Active Clamps for High Voltage Tolerance;295
8.6.6;Example 5.6 Stacked Active Clamps with NPN;296
8.6.7;Example 5.7 Stacked Active Clamps with PNP;297
9;6 ESD Design for Signal Path Analog;298
9.1;6.1 Amplifiers;299
9.1.1;6.1.1 Amplifier Product Families and Specifications;299
9.1.2;6.1.2 ESD Solutions for Amplifiers;305
9.1.3;6.1.3 Bipolar Output High-Voltage Audio Amplifiers;307
9.1.4;6.1.4 Bipolar Output Protection in Low-Voltage Amplifiers;309
9.1.5;6.1.5 Input Protection;310
9.1.6;6.1.6 CMOS Output;312
9.2;6.2 Digital-to-Analog and Analog-to-Digital Converters;313
9.2.1;6.2.1 Functional Blocks for High-Speed DAC;314
9.2.1.1;6.2.1.1 ESD Protection Network;316
9.3;6.3 High-Speed Interface IO pins;318
9.3.1;6.3.1 Interface Analog Products;318
9.3.2;6.3.2 Cable Discharge Event Test Procedure for Integrated Circuits;319
9.3.3;6.3.3 ESD Protection of Interface Pins with CDE Requirements;322
9.4;6.4 Summary;324
9.5;DECIMMTM Simulation Examples for Chapter 6 ;324
9.5.1;Example 6.1a 6.1c Rail-Based Protection with Active 5 V NMOS Clamp and ESD Diodes;325
9.5.2;Example 6.2 Rail-Based Protection with 5 V Snapback NMOS Clamp and ESD Diodes;327
9.5.3;Example 6.3 Trans Impedance Amplifier;329
9.5.4;Example 6.4 CMOS Output Stage ESD Case;329
9.5.5;Example 6.5 CMOS Open Drain Case;330
9.5.6;Example 6.6 BJT Output Stage Case;331
10;7 Power Management Circuits ESD Protection;333
10.1;7.1 Power Management Products;334
10.1.1;7.1.1 Power Management Products and ESD Challenges;334
10.1.1.1;7.1.1.1 Market Trends;334
10.1.1.2;7.1.1.2 ESD Challenges;335
10.1.2;7.1.2 Integrated DC--DC Converters and Controllers;337
10.1.3;7.1.3 Integrated Power Arrays;339
10.1.3.1;7.1.3.1 Power Losses;339
10.1.3.2;7.1.3.2 Self-Protection Capability (SPC) of Integrated Power Arrays;344
10.1.3.3;7.1.3.3 Physical Simulation of DeMOS Power Arrays in ESD Regime;350
10.2;7.2 Low-Voltage Power Circuit ESD Cases;354
10.2.1;7.2.1 LV Power Switching Blocks;354
10.2.2;7.2.2 Step-Down DC--DC Converters;356
10.2.3;7.2.3 Local Snapback Protection of LV Switch Pin;359
10.2.3.1;7.2.3.1 Case Study;359
10.2.3.2;7.2.3.2 Mixed-Mode Simulation;361
10.3;7.3 ESD Protection of Integrated High-Voltage Regulators;363
10.3.1;7.3.1 Asynchronous Integrated Buck Regulator Case;363
10.3.1.1;7.3.1.1 Functionality and ESD Protection;363
10.3.1.2;7.3.1.2 Case Study;365
10.3.2;7.3.2 Synchronous Regulators;367
10.3.2.1;7.3.2.1 HV Power Train Block;367
10.3.2.2;7.3.2.2 Synchronous Buck Regulator;369
10.4;7.4 Controllers;373
10.4.1;7.4.1 Asynchronous Buck-Boost (SEPIC) Controller;375
10.4.2;7.4.2 Synchronous Buck Controller;378
10.5;7.5 Light Management Units and LED Drivers;380
10.5.1;7.5.1 Analog LED Technology;380
10.5.2;7.5.2 LED Drivers;382
10.5.3;7.5.3 Light Management Units;383
10.5.3.1;7.5.3.1 Switch Pin Protection;386
10.5.3.2;7.5.3.2 Feedback Pin Protection;386
10.5.3.3;7.5.3.3 LED Driver Protection;387
10.5.3.4;7.5.3.4 Gate Cl388
10.5.3.5;7.5.3.5 RGB Driver;388
10.5.3.6;7.5.3.6 Control Pins;389
10.5.3.7;7.5.3.7 Current Sink Protection;390
10.6;7.6 A Few More Case Studies;390
10.6.1;7.6.1 Power Array--ESD Clamp Interaction;390
10.6.2;7.6.2 Nepi--Nepi Transient Latch-Up Scenario;393
10.6.3;7.6.3 CDM Case of the High-Voltage Pin Protection;396
10.7;7.7 Summary;399
10.8;DECIMMTM Simulation Examples for Chapter 7;403
10.8.1;Example 7.1 Output Stage of Buck DC--DC Voltage Regulator;403
10.8.2;Example 7.2 5--V Boost DC--DC Converter and Transient Latch-Up;404
10.8.3;Example 7.3 High-Voltage Boost Output Stage;405
10.8.4;Example 7.4 100 600 V Boost Output Stage with Vertical DMOS and IGBT;406
10.8.5;Example 7.5 Power Array with Gate Clamp Example;406
10.8.6;Example 7.6 Serial Data Line Pin Case;407
11;8 System-Level and Discrete Components ESD;410
11.1;8.1 System-Level Specifications and Standards;411
11.1.1;8.1.1 Meaning of ESD Robust System;411
11.1.1.1;8.1.1.1 CE Mark;412
11.1.1.2;8.1.1.2 Basic EMC Standards;412
11.1.1.3;8.1.1.3 Automotive Industry Standards;412
11.1.1.4;8.1.1.4 IC and System-Level Comparison;413
11.1.2;8.1.2 System-Level ESD Pulse and Model;415
11.1.2.1;8.1.2.1 System-Level ESD Test for ICs;415
11.1.2.2;8.1.2.2 IEC ESD Pulse Waveforms;415
11.1.2.3;8.1.2.3 System-Level Test Setup;418
11.1.2.4;8.1.2.4 Cable Discharge Event (CDE);419
11.1.3;8.1.3 Transient Latch-up During a System-Level Event;420
11.1.4;8.1.4 System-Level Protection Components;423
11.2;8.2 On-Wafer Human Metal Model Measurements;424
11.2.1;8.2.1 On-Wafer HMM Tester and Equivalent Circuit of the Pulse;425
11.2.1.1;8.2.1.1 Equivalent Circuit for HMM Simulation;426
11.2.2;8.2.2 HMM-HBM Component Correlation;427
11.2.2.1;8.2.2.1 Diodes Under HMM Stress;429
11.2.2.2;8.2.2.2 LVTSCR;429
11.2.2.3;8.2.2.3 High-Voltage ESD Clamps;430
11.3;8.3 On-Chip Design for System-Level Pins;431
11.3.1;8.3.1 Examples of Circuits with System-Level Protection;431
11.3.1.1;8.3.1.1 On-Chip and Suppressor ESD Device Interaction;436
11.4;8.4 Hot Swap and Hot Plug-in;437
11.4.1;8.4.1 The Concept of Two-Stage SCR ESD Devices;437
11.5;8.5 System-on-Package (SOP) Protection;443
11.6;8.6 ESD Robustness of Discrete Components;444
11.6.1;8.6.1 Discrete Components in High Reliability Systems;444
11.6.2;8.6.2 ESD Requirement for Discrete Components;444
11.6.2.1;8.6.2.1 ESD Effects on Power Transistors;445
11.6.2.2;8.6.2.2 Statistical Approach for ESD and Reliability Parameters Verification;446
11.6.3;8.6.3 Preliminary Numerical Analysis for Devices with Defects and the Two-Transistor Model;447
11.6.4;8.6.4 Experimental Evaluation of Discrete Components Discrete Components Robustness;451
11.6.4.1;8.6.4.1 TLP Stress;452
11.6.4.2;8.6.4.2 ISO System-Level Pulse Test;453
11.6.4.3;8.6.4.3 Collector--Emitter ISO Test;454
11.6.4.4;8.6.4.4 Gate--Collector ISO Tests;456
11.7;8.7 Summary;457
11.8;DECIMM TM Simulation Examples for Chapter 8;458
11.8.1;Example 8.1 System HMM Pulse Simulation;458
11.8.2;Example 8.2 HMM Simulation with PCB Components and TVS;458
11.8.3;Example 8.3 Power Switch;458
12;References;462
13;Index;470




