Shiraki / Pearsall / Kasper SiGe Based Technologies

1. Auflage 1993
ISBN: 978-0-444-59689-5
Verlag: Elsevier Science & Techn.
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, Band Volume 31, 289 Seiten, Web PDF

Reihe: European Materials Research Society Symposia Proceedings

The preparation of silicon germanium microstructures, their physical, chemical and electrical characterization, and their device processing and application are reviewed in this book. Special emphasis is given to ultrathin Si/Ge superlattices. Topics covered include: Wafer preparation and epitaxial growth; surface effects driven phenomena, such as clustering, segregation, 'surfactants'; Analysis, both in situ and ex situ; Strain adjustment methods; High quality buffers; Modification of material properties by quantum wells and superlattices; Devices: Novel concepts, processing, modelling, demonstrators. The questions highlighted, particularly those articles comparing related or competing activities, will provide a wealth of knowledge for all those interested in the future avenues of theory and applications in this field.

Autoren/Hrsg.

Shiraki, Yasuhiro

Shiraki, Y.

Pearsall, T. P.

Kasper, Erwin