Yan / Xu Chemical Vapour Deposition

An Integrated Engineering Design for Advanced Materials
1. Auflage 2010
ISBN: 978-1-84882-894-0
Verlag: Springer
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 342 Seiten

Reihe: Engineering Materials and Processes

'Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials' focuses on the application of this technology to engineering coatings and, in particular, to the manufacture of high performance materials, such as fibre reinforced ceramic composite materials, for structural applications at high temperatures. This book aims to provide a thorough exploration of the design and applications of advanced materials, and their manufacture in engineering. From physical fundamentals and principles, to optimization of processing parameters and other current practices, this book is designed to guide readers through the development of both high performance materials and the design of CVD systems to manufacture such materials. 'Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials' introduces integrated design and manufacture of advanced materials to researchers, industrial practitioners, postgraduates and senior undergraduate students.

Xiu-Tian Yan is a Senior Lecturer in the Department of Design, Manufacture and Engineering Management (DMEM) of the University of Strathclyde. He has been involved in three European Commission funded projects, promoting research exchange in engineering design and manufacture in Europe and Asia. He was a key researcher working on UK government funded Schemebuilder project from 1992-1994. He has 130 refereed publications in total, including 27 journal papers, 3 edited books, 15 book chapters, and 69 refereed international conference papers. He was an Invited Professor from March -August 2007 and was a Visiting Associate Professor at the University of Technology Troyes. He is also a Guest Professor and PhD adviser (since 2005) and Visiting Professor (since 2003) at Northwestern Polytechnical University, China. He has organised several international conferences/symposia and has been a technical paper reviewer for numerous international journals and conferences in his fields. Yongdong Xu passed away shortly after completing this book. At the time of his death he was a professor of the School of Materials Science and Engineering of Northwestern Polytechnical University, and an internationally and nationally recognised researcher in chemical vapour deposition and fibre reinforced ceramic matrix composite materials.

Autoren/Hrsg.

Yan, Xiu-Tian

Xu, Yongdong

Inhaltsverzeichnis

1;Foreword;6
2;Preface;8
3;Contents;12
4;Chapter 1 Introduction to Chemical Vapour Deposition;16
4.1;1.1 Definition of CVD;16
4.1.1;1.3.1 Stage 1: Early Development Era;22
4.1.2;1.3.2 Stage 2: Refining or Purification of Metals Era;22
4.1.3;1.3.3 Stage 3: Microelectronics Manufacture Era;24
4.1.4;1.3.4 Stage 4: Wider Applications Era;25
4.2;1.2 Characteristics of Chemical Vapour Deposition;17
4.3;1.3 Overview of CVD Development;21
4.4;1.4 High-performance Ceramic Matrix Composites and Chemical Vapour Infiltration;28
4.5;1.5 Literature Sources;31
4.5.1;1.5.1 Books;31
4.5.2;1.5.2 Handbooks;31
4.5.3;1.5.3 Journals;32
4.5.4;1.5.4 Conference Proceedings;32
4.5.5;1.5.5 Representative Papers;35
4.6;References;36
5;Chapter 2 Physical Fundamentals of Chemical Vapour Deposition;44
5.1;2.1 Gas Laws and Kinetic Theory;44
5.1.1;2.1.1 Gas Laws;44
5.1.2;2.1.2 Gas Kinetic Theory;46
5.2;2.2 Vacuum Technology;52
5.2.1;2.2.1 Definition and Classification of Vacuum;52
5.2.2;2.2.2 Quantitative Description of the Pumping Process;54
5.2.3;2.2.3 Vacuum Pumps;56
5.2.4;2.2.4 Vacuum Measurement and Leak Detection;66
5.3;2.3 Fundamentals of Gas Transport;69
5.3.1;2.3.1 Transport Coefficients;70
5.3.2;2.3.2 Boundary Layer Theory;76
5.3.3;2.3.3 Some Dimensionless Parameters;78
5.4;2.4 Vapour Pressures of Chemical Vapour DepositionPrecursors;83
5.5;References;85
6;Chapter 3 Chemical Vapour Deposition Systems Design;87
6.1;3.1 Proactive Design Approach for Chemical Vapour Deposition Systems;87
6.2;3.2 General Description of a Chemical Vapour Deposition System;89
6.2.1;3.2.1 Classification of the Chemical Vapour Deposition Methods;89
6.2.2;3.2.2 Configuration of a Chemical Vapour Deposition Apparatus;91
6.3;3.3 Precursor Delivery System;94
6.3.1;3.3.1 Selection Criteria for Chemical Vapour Deposition Precursors;94
6.3.2;3.3.2 Chemical Vapour Deposition Precursors and Their Classification;94
6.3.3;3.3.3 Delivery Methods;96
6.3.4;3.3.4 Devices and Components for the Delivery System;100
6.4;3.4 Reaction Chambers;103
6.4.1;3.4.1 Retorts;105
6.4.2;3.4.2 Gas Inlet Injectors;106
6.4.3;3.4.3 Gas Distributors;106
6.4.4;3.4.4 Exits;109
6.5;3.5 Heating Systems;112
6.6;3.6 Pumping Systems;114
6.7;3.7 Exhaust Gas Handling Systems;117
6.7.1;3.7.1 Cold Traps;117
6.7.2;3.7.2 Chemical Traps;119
6.7.3;3.7.3 Particle Traps;120
6.7.4;3.7.4 Exhaust Gas Scrubbers;120
6.7.5;3.7.5 Venting;121
6.8;3.8 Some Special CVD Processes;121
6.8.1;3.8.1 Laser-induced CVD Process;122
6.8.2;3.8.2 Continuous Chemical Vapour Deposition Process;125
6.8.3;3.8.3 Fluidised-bed Chemical Vapour Deposition Process;128
6.8.4;3.8.4 Catalyst-assisted Chemical Vapour DepositionD Process;132
6.8.5;3.8.5 Combustion Chemical Vapour Deposition;134
6.8.6;3.8.6 High-temperature Chemical Vapour Deposition Process;136
6.9;References;139
7;Chapter 4 Thermodynamics and Kinetics of Chemical Vapour Deposition;143
7.1;4.1 Introduction;143
7.2;4.2 Thermodynamics of Chemical Vapour Deposition;143
7.2.1;4.2.1 Chemical Reaction Feasibility;143
7.2.2;4.2.2 Chemical Vapour Deposition Phase Diagrams;148
7.3;4.3 Kinetics of Chemical Vapour Deposition Process;160
7.3.1;4.3.1 Chemical Vapour Deposition Phenomena;161
7.3.2;4.3.2 Homogeneous Chemical Reactions;161
7.3.3;4.3.3 Heterogeneous Chemical Reactions;167
7.3.4;4.3.4 Surface Kinetics of Chemical Reactions;168
7.3.5;4.3.5 General Description of Chemical Vapour Deposition Growth Kinetics;172
7.4;References;176
8;Chapter 5 Chemical Vapour Infiltration;179
8.1;5.1 Introduction;179
8.2;5.2 Isothermal and Isobaric Chemical Vapour Infiltration;182
8.2.1;5.2.1 General Description;182
8.2.2;5.2.2 Isothermal and Isobaric Chemical Vapour Infiltration Process Model;182
8.2.3;5.2.3 Characteristics of Fibre-reinforced Ceramic-matrix Composites;188
8.2.4;5.2.4 Isothermal and Isobaric Chemical Vapour Infiltration Applications;192
8.3;5.3 Thermal Gradient and Forced Flow Chemical Vapour Infiltration;193
8.3.1;5.3.1 General Description;193
8.3.2;5.3.2 Forced-Flow-Chemical Vapour Infiltration Model;197
8.3.3;5.3.3 Characteristics of Forced-Flow-Chemical Vapour Infiltration Composites;200
8.4;5.4 Thermal Gradient Chemical Vapour Infiltration;202
8.4.1;5.4.1 General Description;202
8.4.2;5.4.2 Some Typical Thermal Gradient/Isobaric Chemical Vapour Infiltration Techniques;203
8.4.3;5.4.3 Temperature Profile Within the Preform;210
8.5;5.5 Liquid-immersion Chemical Vapour Infiltration;212
8.5.1;5.5.1 General Description;212
8.5.2;5.5.2 Model of Liquid-immersion Chemical Vapour Infiltration;214
8.6;5.6 Pulsed Chemical Vapour Infiltration;218
8.6.1;5.6.1 General Description;218
8.6.2;5.6.2 Model;218
8.6.3;5.6.3 Applications;221
8.7;5.7 Chemical Vapour Composite;223
8.8;References;224
9;Chapter 6 Microstructure Evolution and Process Control;228
9.1;6.1 Introduction;228
9.2;6.2 Microstructure Evolution of Chemical Vapour Deposition Deposits;229
9.2.1;6.2.1 Film Formation and Structure Zone Model;229
9.2.2;6.2.2 Microstructure Characteristics of Chemical Vapour Deposition Deposits;233
9.3;6.3 Quantitative Control of Chemical Vapour Deposition Process Parameters;242
9.3.1;6.3.1 Quantitative Control Method Based on Chemical Reaction Mechanism;242
9.3.2;6.3.2 Experimental Basis for Quantitative Control Parameters;251
9.3.3;6.3.3 Quantitative Control Parameters on the Basis of Fluid Mechanics Consideration;256
9.4;6.4 Numerical Design and Analysis Techniques for Flow Field;260
9.4.1;6.4.1 Governing Conservation Partial Equations Used in Computational Fluid Dynamic Approach;261
9.4.2;6.4.2 Computational Fluid Dynamics in Chemical Vapour Deposition;264
9.4.3;6.4.3 Geometry Discretisation and Mesh Generation;265
9.4.4;6.4.4 Boundary and Initial Conditions;270
9.4.5;6.4.5 Iterative Problem Solving Strategy;272
9.4.6;6.4.6 Postprocessing and Visualisation;274
9.4.7;6.4.7 Some Computational fluid dynamics Application Examples;274
9.5;References;280
10;Appendix A Conversion Factors for Pressure Units;283
11;Appendix B Vapour Pressure of Precursors;285
12;Appendix C Chemical Vapour Deposition Materials and Their Corresponding Precursors;290
13;Appendix D Chemical Vapour Deposition Phase Diagram Collection;304
13.1;D.1 Chemical Vapour Deposition Phase Digrams for Borides;304
13.2;D.2 Chemical Vapour Deposition Phase Diagrams for Carbides;306
13.3;D.3 Chemical Vapour Deposition Phase Diagrams for Nitrides;319
13.4;D.4 Chemical Vapour Deposition Phase Diagrams for Oxides;323
13.5;D.5 Chemical Vapour Deposition Phase Diagrams for Silicides;324
13.6;References;327
14;Appendix E Acknowledgment of Figures and Tables Adopted from Other Sources;331
15;Index;345