Bonitz / Horing / Ludwig Introduction to Complex Plasmas

2010
ISBN: 978-3-642-10592-0
Verlag: Springer
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, Band 59, 450 Seiten

Reihe: Springer Series on Atomic, Optical, and Plasma Physics

Complex plasmas differ from traditional plasmas in many ways: these are low-temperature high pressure systems containing nanometer to micrometer size particles which may be highly charged and strongly interacting. The particles may be chemically reacting or be in contact with solid surfaces, and the electrons may show quantum behaviour. These interesting properties have led to many applications of complex plasmas in technology, medicine and science. Yet complex plasmas are extremely complicated, both experimentally and theoretically, and require a variety of new approaches which go beyond standard plasma physics courses. This book fills this gap presenting an introduction to theory, experiment and computer simulation in this field. Based on tutorial lectures at a very successful recent Summer Institute, the presentation is ideally suited for graduate students, plasma physicists and experienced undergraduates.

Autoren/Hrsg.

Bonitz, Michael

Horing, Norman

Ludwig, Patrick

Inhaltsverzeichnis

1;Preface;5
2;Contents;7
3;Contributors;15
4;Part I Introduction;18
4.1;Chapter 1
Complex Plasmas;19
4.1.1;1.1 Plasmas in Nature and in the Laboratory;19
4.1.2;1.2 Complex Plasmas;23
4.1.3;1.3 Low-Temperature Plasmas and Technological Applications;25
4.1.4;1.4 Outline of this book;28
4.1.5;References;29
5;Part II Classical and Quantum Plasmas;30
5.1;Chapter 2
Principles of Transport in Multicomponent Plasmas;31
5.1.1;2.1 Introduction;32
5.1.1.1;2.1.1 Production and Destruction Mechanisms of Negative Ions;33
5.1.1.2;2.1.2 The Drift–Diffusion Approximationfor the Description of Plasma Transport;34
5.1.2;2.2 Ambipolar Diffusion;35
5.1.3;2.3 Temporal Dynamics of Negative Ion Flows in Multicomponent Plasmas;37
5.1.4;2.4 Afterglow in Multicomponent Plasmas and Consequent Wall Fluxes of Negative Ions;41
5.1.5;2.5 Steady-State Profiles of Plasmas with Negative Ions;44
5.1.6;2.6 The Sheath in Strongly Electronegative Gases;47
5.1.7;2.7 The Connection Between Plasmas with Negative Ions, Dusty Plasmas, and Ball Lightning;49
5.1.8;References;52
5.2;Chapter 3
Introduction to Quantum Plasmas;54
5.2.1;3.1 Introduction;54
5.2.2;3.2 Relevant Parameters of Quantum Plasmas;56
5.2.3;3.3 Different States of Quantum Plasmas;59
5.2.4;3.4 Occurrences of Quantum Plasmas;61
5.2.4.1;3.4.1 Astrophysical Plasmas;61
5.2.4.2;3.4.2 Dense Laboratory Plasmas;61
5.2.4.3;3.4.3 Laser Plasmas;62
5.2.4.4;3.4.4 Plasmas in Condensed Matter Systems;62
5.2.4.5;3.4.5 Highly Compressed Two-Component Plasmas: Mott Effect;63
5.2.4.6;3.4.6 Ultra-Dense Plasmas in Nuclear Matter: Quark–Gluon Plasma and the Big Bang;65
5.2.5;3.5 Theoretical Description of Quantum Plasmas;66
5.2.5.1;3.5.1 Basic Equations;67
5.2.5.2;3.5.2 Thermodynamics of Partially Ionized Plasmas;67
5.2.5.2.1;3.5.2.1 Weakly Coupled Quantum Plasmas;69
5.2.5.2.2;3.5.2.2 Chemically Reacting Quantum Plasma;69
5.2.5.3;3.5.3 Spin Effects in Quantum Plasmas;71
5.2.5.4;3.5.4 Bose Plasmas;73
5.2.5.5;3.5.5 Plasmas of Particles Having Fermi Statistics;77
5.2.5.6;3.5.6 Quantum Kinetic Theory;79
5.2.5.7;3.5.7 More Advanced Approach: The Method of Second Quantization;81
5.2.5.8;3.5.8 Other Approaches to Quantum Plasmas;84
5.2.5.8.1;3.5.8.1 Bohmian Quantum Mechanics;85
5.2.5.8.2;3.5.8.2 Quantum Hydrodynamics;86
5.2.6;3.6 Conclusions;88
5.2.7;References;88
5.3;Chapter 4
Introduction to Quantum Plasma Simulations;91
5.3.1;4.1 Introduction;91
5.3.2;4.2 Time-Dependent Schrödinger Equation;92
5.3.2.1;4.2.1 1D Crank–Nicolson Method;93
5.3.2.1.1;4.2.1.1 Boundary Conditions;95
5.3.2.1.2;4.2.1.2 Absorbing Boundary Conditions;96
5.3.2.1.3;4.2.1.3 Initial Conditions;96
5.3.2.2;4.2.2 TDSE Solution in Basis Representation;98
5.3.2.2.1;4.2.2.1 Deriving a Time Evolution Scheme;99
5.3.2.2.2;4.2.2.2 Computation of Matrix Elements of Uij;99
5.3.2.3;4.2.3 Computational Example: Electron Scattering in a Laser Field;100
5.3.3;4.3 Hartree–Fock Method;101
5.3.3.1;4.3.1 Standard Approach;102
5.3.3.2;4.3.2 NEGF Approach;104
5.3.3.3;4.3.3 Example;106
5.3.4;4.4 Quantum Monte Carlo Methods;109
5.3.4.1;4.4.1 Metropolis Monte Carlo Method;110
5.3.4.2;4.4.2 Path-Integral Monte Carlo;112
5.3.5;4.5 Summary;117
5.3.6;References;118
5.4;Chapter 5
Quantum Effects in Plasma Dielectric Response: Plasmons and Shielding in Normal Systems and Graphene;120
5.4.1;5.1 Introduction;120
5.4.1.1;5.1.1 Background;120
5.4.1.2;5.1.2 Quantum Theory of Dielectric Response;122
5.4.2;5.2 Quantum Effects in Normal Solid-State Plasmas;124
5.4.2.1;5.2.1 Three-Dimensional Quantum Plasma;124
5.4.2.2;5.2.2 Dielectric Properties of Low-Dimensional Systems;126
5.4.2.3;5.2.3 Dielectric Function of a Magnetized Quantum Plasma;128
5.4.3;5.3 Graphene;132
5.4.3.1;5.3.1 Introduction;132
5.4.3.2;5.3.2 Graphene Hamiltonian, Green's Function,and RPA Dielectric Function;134
5.4.3.3;5.3.3 Some Physical Features of Graphene;138
5.4.4;5.4 Summary;141
5.4.5;References;142
6;Part III Strongly Coupled and Dusty Plasmas;144
6.1;Chapter 6
Imaging Diagnostics in Dusty Plasmas;145
6.1.1;6.1 Introduction;145
6.1.2;6.2 Imaging 2D Systems;146
6.1.2.1;6.2.1 Imaging Particles;146
6.1.2.2;6.2.2 Image Analysis;148
6.1.2.2.1;6.2.2.1 Threshold Method;149
6.1.2.2.2;6.2.2.2 Moment Method;149
6.1.2.2.3;6.2.2.3 Moment Method with Gaussian Bandpass Filter;150
6.1.2.2.4;6.2.2.4 Least Quadratic Kernel Method;150
6.1.3;6.3 Imaging 3D Systems;151
6.1.3.1;6.3.1 Scanning Video Microscopy;151
6.1.3.2;6.3.2 Color Gradient Method;152
6.1.3.3;6.3.3 Stereoscopy;153
6.1.3.4;6.3.4 Digital Holography;156
6.1.4;6.4 Summary and Outlook;162
6.1.5;References;162
6.2;Chapter 7
Structure and Dynamics of Finite Dust Clusters;164
6.2.1;7.1 Introduction;164
6.2.2;7.2 Trapping of Dust Clouds;165
6.2.3;7.3 Formation of Finite Dust Clusters;167
6.2.4;7.4 Structural Transitions in 1D Dust Clusters;167
6.2.5;7.5 Structure of 2D Dust Clusters;169
6.2.6;7.6 Normal Mode Dynamics of Dust Clusters;170
6.2.7;7.7 Formation of 3D Dust Clusters;172
6.2.8;7.8 Structure of 3D Dust Clusters;174
6.2.9;7.9 Metastable Configurations of Yukawa Balls;176
6.2.10;7.10 Shell Transitions in Yukawa Balls;179
6.2.11;7.11 Dynamical Properties of Yukawa Balls;180
6.2.12;7.12 Summary;181
6.2.13;References;182
6.3;Chapter 8
Statistical Theory of Spherically Confined Dust Crystals;184
6.3.1;8.1 Introduction;184
6.3.2;8.2 Variational Problem of the Energy Functional;185
6.3.3;8.3 Ground-State Density Profile Within Mean-Field Approximation;189
6.3.3.1;8.3.1 The Coulomb Limit and Electrostatics;189
6.3.3.2;8.3.2 General Solution;190
6.3.3.3;8.3.3 Density Profile for Harmonic Confinement;192
6.3.3.4;8.3.4 Force Equilibrium Within Yukawa Electrostatics;194
6.3.4;8.4 Simulation Results of Spatially Confined Dust Crystals;196
6.3.4.1;8.4.1 Ground-State Simulations;197
6.3.4.2;8.4.2 Comparison of Simulation and Mean-Field Results;199
6.3.5;8.5 Inclusion of Correlations by Using the Local Density Approximation;200
6.3.5.1;8.5.1 LDA Without Correlations;201
6.3.5.2;8.5.2 LDA with Correlations;204
6.3.5.3;8.5.3 Comparison of Simulation and LDA Results;206
6.3.6;8.6 Shell Models of Spherical Dust Crystals;207
6.3.7;8.7 Summary and Discussion;209
6.3.8;References;210
6.4;Chapter 9
PIC–MCC Simulations of Capacitive High-Frequency Discharge Dynamics with Nanoparticles;211
6.4.1;9.1 Introduction;211
6.4.2;9.2 Combined PIC–MCC Approach for Fast Simulation of a Radio-Frequency Discharge at Low Gas Pressure;213
6.4.2.1;9.2.1 Combined PIC–MCC Approach;214
6.4.2.2;9.2.2 Description of the Algorithm;215
6.4.2.3;9.2.3 How Many Simulation Particles We Need?;218
6.4.2.4;9.2.4 Simulation Results of a CCRF-Discharge in Helium and Argon;219
6.4.3;9.3 Physical Model of Discharge Plasma with Movable Dust;225
6.4.3.1;9.3.1 Algorithm of Calculation;226
6.4.3.2;9.3.2 Ion Drag Force;228
6.4.3.3;9.3.3 Transition Between Different Modes;230
6.4.3.4;9.3.4 Dust Motion Effect;233
6.4.4;9.4 Conclusion;236
6.4.5;References;238
6.5;Chapter 10
Molecular Dynamics Simulation of Strongly Correlated Dusty Plasmas;239
6.5.1;10.1 Introduction;239
6.5.2;10.2 Basics of Molecular Dynamics Simulation;240
6.5.2.1;10.2.1 Simulation Model of Strongly Coupled Dusty Plasmas;242
6.5.2.2;10.2.2 Equations of Motion of a One-Component Plasma;244
6.5.2.3;10.2.3 Velocity Verlet Integration Scheme;246
6.5.2.4;10.2.4 Runge–Kutta Integration Scheme;247
6.5.3;10.3 Equilibrium Simulations: Thermodynamic Ensembles;248
6.5.3.1;10.3.1 Velocity Scaling;249
6.5.3.2;10.3.2 Stochastic Thermostats;249
6.5.3.3;10.3.3 Nosé–Hoover Thermostat;250
6.5.3.4;10.3.4 Langevin Dynamics Simulation;250
6.5.3.5;10.3.5 Dimensionless System of Units;252
6.5.4;10.4 Simulation of Macroscopic Systems;253
6.5.4.1;10.4.1 Potential Truncation;253
6.5.4.2;10.4.2 Electrostatic Interactions;254
6.5.4.3;10.4.3 Finding of Neighboring Particles;254
6.5.4.4;10.4.4 Periodic Boundary Conditions;255
6.5.5;10.5 Input and Output Quantities;257
6.5.5.1;10.5.1 Pair Distribution Function and Static StructureFactor;257
6.5.5.2;10.5.2 Transport Properties;259
6.5.6;10.6 Applications I: Mesoscopic Systems in Traps;259
6.5.6.1;10.6.1 Simulated Annealing;260
6.5.6.2;10.6.2 Effect of Screening;262
6.5.6.3;10.6.3 Effect of Friction;263
6.5.7;10.7 Applications II: Macroscopic Systems;266
6.5.7.1;10.7.1 Simulation Results;267
6.5.8;10.8 Conclusion;269
6.5.9;References;270
7;Part IV Reactive Plasmas, Plasma–Surface Interaction, and Technological Applications;273
7.1;Chapter 11
Nonthermal Reactive Plasmas;274
7.1.1;11.1 Introduction;274
7.1.2;11.2 Nonthermal Plasma Conditions;278
7.1.3;11.3 Plasma Kinetics and Plasma Chemical Reactions;279
7.1.3.1;11.3.1 Boltzmann Equation;279
7.1.3.2;11.3.2 Reaction Rate Coefficient;281
7.1.4;11.4 Plasma–Surface Interaction;283
7.1.4.1;11.4.1 Plasma Sheath;283
7.1.4.2;11.4.2 Surface on Floating Potential;284
7.1.4.3;11.4.3 High-Voltage Plasma Sheath, Radio-Frequency
Plasma Sheath;285
7.1.5;11.5 Low-Pressure Oxygen rf-Plasma;287
7.1.5.1;11.5.1 Plasma Characterization;288
7.1.5.1.1;11.5.1.1 Electric Probe Measurement, Positive Ion Density;288
7.1.5.1.2;11.5.1.2 Microwave Interferometry, Electron Density;289
7.1.5.1.3;11.5.1.3 Ion Analysis at Discharge Electrodes (Positive and Negative Oxygen Ions);290
7.1.5.1.4;11.5.1.4 Optical Emission Spectroscopy, rf-Phase-Resolved Optical Spectroscopy;292
7.1.5.1.5;11.5.1.5 Atomic Oxygen Ground-State Density;296
7.1.5.2;11.5.2 Interaction of Oxygen Plasma with Polymers;298
7.1.5.2.1;11.5.2.1 Fourier Transform Infrared Spectroscopy of Thin Polymer Films;298
7.1.5.2.2;11.5.2.2 Spectroscopic Ellipsometry of Thin Plasma-Treated Polymer Films;301
7.1.5.2.3;11.5.2.3 Mass Spectrometric Investigation of Reaction Products in Plasma/Gas Phase;302
7.1.6;References;303
7.2;Chapter 12
Formation and Deposition of Nanosize Particles on Surfaces;305
7.2.1;12.1 Introduction;305
7.2.2;12.2 Magnetron Discharge;306
7.2.3;12.3 Nucleation Processes in a Magnetron Plasma;308
7.2.4;12.4 Nanosize Cluster Deposition;311
7.2.5;12.5 Melting Temperature and Lattice Parameters of Ag Clusters;313
7.2.6;12.6 Rapid-Thermal Annealing (RTA) of Deposited Cluster Films;314
7.2.7;12.7 Evaporation of Clusters;318
7.2.8;12.8 Conclusions;319
7.2.9;References;319
7.3;Chapter 13
Kinetic and Diagnostic Studies of Molecular Plasmas Using Laser Absorption Techniques;321
7.3.1;13.1 Introduction;322
7.3.2;13.2 Plasma Chemistry and Reaction Kinetics;325
7.3.2.1;13.2.1 Studies of Ar/H2/N2/O2 Microwave Plasmas;325
7.3.2.2;13.2.2 On the Importance of Surface Associationto the Formation of Molecules in a Recombining N2/O2 Plasma;328
7.3.3;13.3 Kinetic Studies and Molecular Spectroscopy of Radicals;332
7.3.3.1;13.3.1 Line Strengths and Transition Dipole Moment of CH3;332
7.3.3.1.1;13.3.1.1 The
2 Fundamental Band;332
7.3.3.1.2;13.3.1.2 The 2 First Hot Band;334
7.3.3.2;13.3.2 Molecular Spectroscopy of the CN Radical;336
7.3.4;13.4 Quantum Cascade Laser Absorption Spectroscopy for Plasma Diagnostics and Control;337
7.3.4.1;13.4.1 General Considerations;337
7.3.4.2;13.4.2 Time-Resolved Study of a Pulsed DC Discharge: NO and Gas Temperature Kinetics;339
7.3.4.3;13.4.3 Trace Gas Measurements Using Optically Resonant Cavities;341
7.3.4.4;13.4.4 In Situ Monitoring of Plasma Etch Processes with a QCL Arrangement in Semiconductor Industrial Environment;344
7.3.5;13.5 Summary and Conclusions;346
7.3.6;References;346
7.4;Chapter 14
X-Ray Diagnostics of Plasma-Deposited Thin Layers;350
7.4.1;14.1 Introduction;350
7.4.2;14.2 X-Ray Analytical Methods;352
7.4.2.1;14.2.1 Grazing Incidence X-Ray Diffractometry, Asymmetric Bragg Case;352
7.4.2.2;14.2.2 GIXD, Bragg Case, Specular Reflected;353
7.4.2.3;14.2.3 X-Ray Reflectometry;354
7.4.3;14.3 Examples;355
7.4.3.1;14.3.1 Characterization of ITO Films;355
7.4.3.2;14.3.2 Study of Al2O3 Formation During Microwave Plasma Treatment of Al Films in Ar–O2 Gas Mixtures;363
7.4.4;14.4 Summary;370
7.4.5;References;370
7.5;Chapter 15
The Use of Nonthermal Plasmas in Environmental Applications;371
7.5.1;15.1 Introduction;371
7.5.2;15.2 Commercially Viable, Large-Scale Plasma-Based Environmental Applications;373
7.5.2.1;15.2.1 Ozonizers;373
7.5.2.1.1;15.2.1.1 Historical Background;373
7.5.2.1.2;15.2.1.2 Ozone Properties and Ozone Applications;373
7.5.2.1.3;15.2.1.3 Ozone Formation in Electrical Discharges;374
7.5.2.1.4;15.2.1.4 Technical Aspects of Large Ozone Generators;376
7.5.2.1.5;15.2.1.5 Future Prospects of Industrial Ozone Generation;377
7.5.2.2;15.2.2 Electrostatic Precipitation;377
7.5.2.2.1;15.2.2.1 Historical Background;377
7.5.2.2.2;15.2.2.2 Main Physical Processes Involved in Electrostatic Precipitation;378
7.5.2.2.3;15.2.2.3 Large Industrial Electrostatic Precipitators;379
7.5.2.2.4;15.2.2.4 Summary;381
7.5.3;15.3 Decomposition of Volatile Organic Compounds in Microplasmas;381
7.5.3.1;15.3.1 Experimental Details;381
7.5.3.2;15.3.2 VOC Destruction Efficiency;383
7.5.3.3;15.3.3 Byproduct Formation;385
7.5.3.4;15.3.4 Kinetic Studies;386
7.5.3.5;15.3.5 Summary;389
7.5.4;15.4 Pulsed Electrical Discharges in Water;390
7.5.4.1;15.4.1 Background;390
7.5.4.2;15.4.2 Experimental Systems;391
7.5.4.3;15.4.3 Selected Experimental Results;393
7.5.4.4;15.4.4 Summary;395
7.5.5;15.5 Conclusion;395
7.5.6;References;396
7.6;Chapter 16
Complex (Dusty) Plasmas: Application in Material Processing and Tools for Plasma Diagnostics;399
7.6.1;16.1 Introduction;399
7.6.2;16.2 Disturbing Side Effects of Dust Particles in Plasma Processing;400
7.6.3;16.3 Formation and Modification of Powder Particles in Plasmas for Various Industrial Applications;402
7.6.3.1;16.3.1 Coating of Powder Particles in a Magnetron Discharge;406
7.6.3.2;16.3.2 Deposition of Protective Coatings on Individual Phosphor Particles;411
7.6.3.3;16.3.3 Particles as Microsubstrates;414
7.6.4;16.4 Particles as Electrostatic Probes;417
7.6.4.1;16.4.1 Dust Particles in Front of an Adaptive Electrode;421
7.6.4.2;16.4.2 Interaction Between Dust Particles and Ion Beams;430
7.6.5;16.5 Particles as Thermal Probes;438
7.6.6;References;443
8;Index;447