Defaÿ Ferroelectric Dielectrics Integrated on Silicon
1. Auflage 2013
ISBN: 978-1-118-60280-5
Verlag: John Wiley & Sons
Format: EPUB
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
E-Book, Englisch, 448 Seiten, E-Book
ISBN: 978-1-118-60280-5
Verlag: John Wiley & Sons
Format: EPUB
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
This book describes up-to-date technology applied to high-Kmaterials for More Than Moore applications, i.e. microsystemsapplied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-Kdielectrics thin films including extrinsic effects, this bookemphasizes the specificity of thin films. Deposition and patterningtechnologies are then presented. A whole chapter is dedicated tothe major role played in the field by X-Ray Diffractioncharacterization, and other characterization techniques are alsodescribed such as Radio frequency characterization. An in-depthstudy of the influence of leakage currents is performed togetherwith reliability discussion. Three applicative chapters coverintegrated capacitors, variables capacitors and ferroelectricmemories. The final chapter deals with a reasonably new researchfield, multiferroic thin films.
