High Power Impulse Magnetron Sputtering

Fundamentals, Technologies, Challenges and Applications
Erscheinungsjahr 2019
ISBN: 978-0-12-812454-3
Verlag: Elsevier Science Publishing Co Inc

Buch, Englisch, 398 Seiten, Format (B × H): 229 mm x 152 mm, Gewicht: 618 g

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes.

Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.

Zielgruppe

<p>Researchers within the Vacuum equipment, semiconductor, automotive, aeronautic, glass, medical applications industries and academics within the  Materials science, plasma physics, and nanomaterials areas.</p>

Autoren/Hrsg.

Lundin, Daniel

Minea, Tiberiu

Gudmundsson, Jon Tomas

Fachgebiete

• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde
• Naturwissenschaften Physik Thermodynamik Plasmaphysik

Inhaltsverzeichnis

1. Introduction (particle surface interaction) 2. Power coupling 3. HiPIMS process characteristics 4. Reactive HiPIMS 5. HiPIMS modeling 6. Physics of HiPIMS 7. HiPIMS thin films 8. Industrialization of HiPIMS

Über Autor(innen)

Gudmundsson, Jon Tomas
Jon Tomas Gudmundsson has spent the last 18 years as a professor at the University of Iceland both within the Physics and Engineering schools. He holds a Ph.D. from the University of California, Berkeley, in Nuclear Engineering and his current field of study includes the characterization of the high power impulse magnetron sputtering (HiPIMS) discharge using a Langmuir probe, as well as plasma characterization, plasma chemistry and photovoltaics. He was the keynote speaker at the 4th Magnetron, Ion Processing & Arc Technologies European Conference in December 2015 where he presented a paper on The current waveform in reactive high power impulse magnetron sputtering.

Minea, Tiberiu
Tiberiu Minea, Ph.D. is currently serving as the Director the Laboratory of Physics and Gases and Plasmas at the University of Paris-Sud where he heads the group researching the theory and modeling of plasmas - discharge and surfaces. He is the President of the French Federation of Scientific Societies, as well as the president of Scientific and Technical Committee of SFV. Dr. Minea has published over 84 peer reviewed articles and has been an invited speaker at numerous conferences for his work on HiPIMS.

Lundin, Daniel
Daniel Lundin, Ph.D., has been working in the field of thin film synthesis using plasma-based techniques. His current research is focused on understanding and characterizing low-pressure plasma discharges, in particular the thin film plasma deposition technique High Power Impulse Magnetron Sputtering (HiPIMS) and magnetron sputtering as a new type of surface coating technique. In 2008 his research on the HiPIMS process was awarded the Institute of Physics Prize for novelty, significance and potential impact on future research. In 2009 he was ranked as one of Sweden's young 'Supertalents' by the Swedish business journal Veckans Affärer. Dr. Lundin has published more than 40 papers on HiPIMS and is currently working as a senior researcher at the University of Paris-Sud/CNRS.