Lundin / Minea / Gudmundsson High Power Impulse Magnetron Sputtering

Fundamentals, Technologies, Challenges and Applications
1. Auflage 2019
ISBN: 978-0-12-812455-0
Verlag: Elsevier Science & Techn.
Format: EPUB
Kopierschutz: 6 - ePub Watermark

E-Book, Englisch, 398 Seiten

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. - Includes a comprehensive description of the HiPIMS process from fundamental physics to applications - Provides a distinctive link between the process plasma and thin film communities - Discusses the industrialization of HiPIMS and its real world applications

Autoren/Hrsg.

Lundin, Daniel

Minea, Tiberiu

Gudmundsson, Jon Tomas