Hass / Francombe / Vossen Physics of Thin Films

Advances in Research and Development
1. Auflage 2013
ISBN: 978-1-4831-4499-3
Verlag: Elsevier Science & Techn.
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 340 Seiten, Web PDF

Physics of Thin Films: Advances in Research and Development, Volume 12 reviews advances that have been made in research and development concerning the physics of thin films. This volume covers a wide range of preparative approaches, physics phenomena, and applications related to thin films. This book is comprised of four chapters and begins with a discussion on metal coatings and protective layers for front surface mirrors used at various angles of incidence from the ultraviolet to the far infrared. Thin-film materials and deposition conditions suitable for minimizing reflectance changes with angle of incidence are described, along with novel oxide protective coatings with enhanced chemical stability and mechanical durability. The next chapter offers a comprehensive treatment of photoemissive materials. After giving a rather detailed review of the physics of photoemission, the main classes of thin-film photoemitters, including Ag-O-Cs, alkali antimonides, and negative-electron affinity photocathodes, are considered. A description of field-assisted cathodes potentially suitable for wavelengths beyond 1.1 micrometers, such as transferred-electron structures and field-emission arrays, is also given. The reader is then introduced to spray pyrolysis and the solution growth technique for chemical solution deposition of inorganic films. This text concludes with a chapter on plasma-enhanced chemical vapor deposition of thin films, paying particular attention to the experimental conditions required for a range of element and compound materials as well as some of the unusual film properties and structures achieved by this approach. This monograph will be useful to students and practitioners of physics, especially those interested in thin films.

Autoren/Hrsg.

Hass, Georg

Francombe, Maurice H.

Vossen, John L.

Inhaltsverzeichnis

1;Front Cover;1
2;Physics of Thin Films: Advances in Research and Development;4
3;Copyright Page;5
4;Table of Contents;6
5;Contributors to Volume 12;8
6;Preface;10
7;Articles Planned for Future Volumes;12
8;Contents of Previous Volumes;14
9;Chapter 1. Reflectance and Preparation of Front Surface Mirrors forUse at Various Angles of Incidence from theUltraviolet to the Far Infrared;20
9.1;I. Introduction;21
9.2;II. Reflectance Measurements and Preparationof Mirror Coatings;22
9.3;III. Reflectance of Metallic Front Surface Mirrorswithout Overcoatings;35
9.4;IV. Mirror Coatings with Protective Layers andReflectance-Enhancing Surface Films;41
9.5;V. Metal-Dielectric Mirrors for Useas Reflection-Type Filters;61
9.6;VI. Water Absorption in Evaporated Dielectric Films;65
9.7;References;68
10;Chapter 2. Photoemissive Materials;72
10.1;I. Introduction;73
10.2;II. The Mechanism of Photoemission;73
10.3;III. The Ag-O-Cs (S-1) Photocathode;89
10.4;IV. The Alkali Antimonides;103
10.5;V. Negative Electron Affinity Materials;131
10.6;VI. Applications of Photoemissive Materials;159
10.7;VII. Conclusions;176
10.8;ACKNOWLEDGMENTS;177
10.9;References;177
11;Chapter 3. Chemical Solution Deposition of Inorganic Films;186
11.1;I. Introduction;187
11.2;II. Spray Pyrolytic Process;188
11.3;III. Characteristic Features of the Spray Pyrolytic Process;197
11.4;IV. Multicomponent Doping and Alloying Effects;200
11.5;V. Structural Properties;206
11.6;VI. Electrical and Optical Properties;211
11.7;VII. Solution Growth Process;220
11.8;VIII. Impurity and Dopant Effects;230
11.9;IX. Multicomponent Films;231
11.10;X. Oxide Films;232
11.11;XI. Structure;233
11.12;XII. Transport Properties;236
11.13;XIII. Some Large-Area Applications;242
11.14;XIV. Concluding Remarks;249
11.15;References;251
12;Chapter 4. Plasma-Enhanced Chemical Vapor Depositionof Thin Films;256
12.1;I. Introduction;256
12.2;II. Deposition Techniques and Systems;257
12.3;III. Preparation and Properties of Films;265
12.4;IV. Plasma Oxidation;294
12.5;V. Plasma Carburizing;302
12.6;VI. Glow-Discharge Nitriding;305
12.7;VII. Conclusions;308
12.8;References;308
13;Author Index;316
14;Subject Index;331