Plasma Etching

Fundamentals and Applications
Erscheinungsjahr 1998
ISBN: 978-0-19-856287-0
Verlag: OUP Oxford

Buch, Englisch, Band 7, 356 Seiten, laminated boards, Format (B × H): 161 mm x 240 mm, Gewicht: 705 g

Reihe: Series on Semiconductor Science and Technology

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.

Autoren/Hrsg.

Sugawara, Minoru

Sugawara, M.

Fachgebiete

• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Bauelemente, Schaltkreise
• Naturwissenschaften Physik Thermodynamik Plasmaphysik

Über Autor(innen)

Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: [phone]