Chiang / Kawa Design for Manufacturability and Yield for Nano-Scale CMOS

1. Auflage 2007
ISBN: 978-1-4020-5188-3
Verlag: Springer Netherland
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 255 Seiten, eBook

Reihe: Integrated Circuits and Systems

Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design’s manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.

Zielgruppe

Research

Autoren/Hrsg.

Chiang, Charles

Kawa, Jamil

Inhaltsverzeichnis

Random Defects.- Systematic Yield - Lithography.- Systematic Yield - Chemical Mechanical Polishing (CMP).- Variability & Parametric Yield.- Design for Yield.- Yield Prediction.- Conclusions.

Über Autor(innen)

Dr. Charles Chiang is R&D Director of the Advanced Technology Group at Synopsys Inc. in Mountain View, CA, USA