Chiang / Kawa Design for Manufacturability and Yield for Nano-Scale CMOS

2007
ISBN: 978-1-4020-5188-3
Verlag: Springer Netherland
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 255 Seiten, eBook

Reihe: Integrated Circuits and Systems

This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.

Zielgruppe

Research

Autoren/Hrsg.

Chiang, Charles

Kawa, Jamil

Inhaltsverzeichnis

1. Introduction of DFM/DFY. a. What is DFM/DFY ? historical perspective. b. Why is it becoming ever so critical? c. DFM categories & classifications. d. How do various DFM solutions tie up with specific design flows. e. DFM & DFY are intertwined. 2. Random Defects. a. CAA. b. Improving CAA. c. Cell library yield grading based on CAA. 3. Systematic yield. a. Lithography. 4. Systematic yield. b. CMP 5. Parametric yield. a. Intro. b. Timing aspects. c. Power considerations. 6. Design for yield. a. analysis. b. prediction. c. enhancement. 7. Summary and Conclusions

Über Autor(innen)

Dr. Charles Chiang is R&D Director of the Advanced Technology Group at Synopsys Inc. in Mountain View, CA, USA