Handbook of VLSI Microlithography

Principles, Technology and Applications
Erscheinungsjahr 2010
ISBN: 978-0-8155-1281-3
Verlag: William Andrew Publishing

Buch, Englisch, 671 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 1030 g

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry.

The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production.

Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Zielgruppe

For workers in the Very Large Scale Integrated Circuit (VLSI) industry involved with production of high density integrated circuit semiconductors such as DRAM--including production engineers, research and development scientists and technicians as well as academics.

Autoren/Hrsg.

Glendinning, William B.

Helbert, John N.

Fachgebiete

• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Bauelemente, Schaltkreise

Inhaltsverzeichnis

Issues and Trends Affecting Lithography Tool Selection Strategy

Resist Technology ù Design, Processing, and Applications

Lithography Process Monitoring and Defect Detection

Techniques and Tools for Photo Metrology

Techniques and Tools for Optical Lithography

Microlithography Tool Automation

Electron-Beam ULSI Applications

Rational Vibration and Structural Dynamics for Lithographic Tool Installations

Applications of Ion Microbeams Lithography and Direct Processing

X-Ray Lithography

Part I

Part II

Acknowledgment

References

Index

Über Autor(innen)

Glendinning, William B.
John Helbert is a Senior Member of the Motorola Technical Staff. He earned his doctorate in Physical