Buch, Englisch, 396 Seiten, Format (B × H): 157 mm x 235 mm, Gewicht: 1710 g
Buch, Englisch, 396 Seiten, Format (B × H): 157 mm x 235 mm, Gewicht: 1710 g
Reihe: Lasers, Photonics, and Electro-Optics
ISBN: 978-0-306-44936-9
Verlag: Springer US
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.
Zielgruppe
Research
Autoren/Hrsg.
Fachgebiete
- Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Mikroprozessoren
- Technische Wissenschaften Sonstige Technologien | Angewandte Technik Lasertechnologie, Holographie
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Verbundwerkstoffe
Weitere Infos & Material
1. Introduction.- 2. Pyrolytic LCVD.- 3. Photolytic LCVD.- 4. Pyrolytic LCVD Modeling.- 5. Photolytic LCVD Modeling.- A.1. Definitions of Energy Density, Irradiance, and Intensity.- A.2. Thermal Stress Analysis.- A.3. Volumetric Absorption Rate.- Nomenclature.- References.
