Buch, Englisch, 372 Seiten, Format (B × H): 234 mm x 161 mm, Gewicht: 660 g
Fundamentals and Applications
Buch, Englisch, 372 Seiten, Format (B × H): 234 mm x 161 mm, Gewicht: 660 g
ISBN: 978-981-4303-75-0
Verlag: Pan Stanford Publishing Pte Ltd
Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates. The significance of this method for patterning surfaces is that the technique is fast, simple, and less expensive. The possibility to create patterns on very large areas at once makes it even more attractive. This book reviews various fascinating results, understand the underlying physics of ion induced pattern formation, to highlight the potential applications of the patterned surfaces, and to explore the patterning behavior by different irradiation parameters in order to create desired surface morphologies on specific materials.
Zielgruppe
Academic and Postgraduate
Autoren/Hrsg.
Fachgebiete
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Produktionstechnik Fertigungstechnik
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Biomaterialien, Nanomaterialien, Kohlenstoff
- Technische Wissenschaften Technik Allgemein Nanotechnologie
Weitere Infos & Material
Elements of Sputtering Theory. Sputter-Ripple Formation on Flat and Rough Surfaces – A Case Study with Si. Low Energy Ion Induced Pattern Formation in Si-Ge Alloy. Patterning of Ionic Insulator Surfaces with Low Energy Ion Beams. Nanostructures of Thin Films by keV Ion Beams. Surface Nanopatterns on Si(100) by Normal-Incidence Ion Sputtering with Metal Incorporation. Kinetic Monte Carlo Simulations of Low Energy Ion-Induced Surface Patterning. From Cascades to Patterns: A Monte Carlo Approach. Understanding Surface Patterning by Lattice Gas Models. Applications of Ion Induced Patterned Substrates in Plasmonics.
