Som / Kanjilal Nanofabrication by Ion-Beam Sputtering

Fundamentals and Applications
Erscheinungsjahr 2013
ISBN: 978-981-4303-76-7
Verlag: Pan Stanford Publishing
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)

E-Book, Englisch, 356 Seiten

Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates. The significance of this method for patterning surfaces is that the technique is fast, simple, and less expensive. The possibility to create patterns on very large areas at once makes it even more attractive. This book reviews various fascinating results, understand the underlying physics of ion induced pattern formation, to highlight the potential applications of the patterned surfaces, and to explore the patterning behavior by different irradiation parameters in order to create desired surface morphologies on specific materials.

Autoren/Hrsg.

Som, Tapobrata

Kanjilal, Dinakar

Fachgebiete

• Technische Wissenschaften Technik Allgemein Nanotechnologie
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Produktionstechnik Fertigungstechnik
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Biomaterialien, Nanomaterialien, Kohlenstoff

Inhaltsverzeichnis

Elements of Sputtering Theory, Peter Sigmund
Introduction
General aspects
High-energy cascade dynamics
Input
Low-energy dynamics
Concluding remarks

Sputter-Ripple Formation on Flat and Rough Surfaces – A Case Study with Si, S.A. Mollick and D. Ghose
Introduction
Mechanisms of pattern formation
Sample preparation and analysis
Results and discussion
Conclusions

Low Energy Ion Induced Pattern Formation in Si-Ge Alloy, Subhendu Sarkar
Introduction
Theoretical aspects
Patterning of alloy surfaces
Studies on SiGe surfaces
Ion beam effects
Conclusion and outlook

Patterning of Ionic Insulator Surfaces with Low Energy Ion Beams, Franciszek Krok, Salah R. Saeed, Marek Kolmer, and Marek Szymonski
Introduction
Remarks on experimental details
Surface morphology changes at the initial stages of ion bombardment
Ripple formation for prolonged irradiation with off normal incidence ion beam
Temperature dependent patterning of ionic single crystal surfaces
Electronic versus ballistic processes on ion irradiated ionic surfaces
Concluding remarks

Nanostructures of Thin Films by keV Ion Beams, Prasanta Karmakar
Introduction
Variation of surface patterns
Origin of ion induced nanostructure formation
Dependence on local ion impact angle
Spatially resolved magnetic and electric zone formation
Coulomb explosion sputtering of spatially oxidized nanostructures
Summary

Surface Nanopatterns on Si(100) by Normal-Incidence Ion Sputtering with Metal Incorporation, Raúl Gago, José A. Sánchez-García, Andrés Redondo-Cubero, and Luis Vázquez
Introduction
Experiment
Nanopattern formation with a cold-cathode ion source
Role of metal incorporation on the pattern selectivity
On the mechanism of pattern selectivity and outlook
Conclusions

Kinetic Monte Carlo Simulations of Low Energy Ion-Induced Surface Patterning, Wai-Lun Chan and Eric Chason
Introduction
KMC model
Ripples formation in the linear instability regime
Dependence of ripple wavelength on temperature and ion flux
Barrier for ripples formation in the low flux and high temperature regime
Effect of multiple defects
Conclusions

From Cascades to Patterns: A Monte Carlo Approach, Reiner Kree and Taha Yasseri
Introduction
Lessons from BCA and Kinetic Theory
Basic Monte Carlo model
Variants and refinements
Conclusions

Understanding Surface Patterning By Lattice Gas Models, Géza Ódor, Bertosz Liedke, and Karl-Heinz Heinig
Introduction
Mapping of surface adsorption or desorption onto lattice gases
Numerical simulation for Kardar-Parisi-Zhang (KPZ)
The surface diffusion model in 2D
Pattern generation by competing inverse MH and KPZ processes
KPZ in the presence of normal surface diffusion
Conclusion and outlook

Applications of Ion Induced Patterned Substrates in Plasmonics, Mukesh Ranjan, Thomas W. H. Oates, and Stefan Facsko
Introduction: Demand of plasmonics
Scaling laws to produce ripple templates for plasmonic application
Metal film growth on rippled templates by PVD methods
Plasmonic properties
Conclusions