E-Book, Englisch, 150 Seiten
Vilaithong / Boonyawan / Thongbai PIM & ASIP 2004
Erscheinungsjahr 2005
ISBN: 978-3-03813-028-4
Verlag: Trans Tech Publications
Format: PDF
Kopierschutz: 0 - No protection
E-Book, Englisch, 150 Seiten
ISBN: 978-3-03813-028-4
Verlag: Trans Tech Publications
Format: PDF
Kopierschutz: 0 - No protection
Volume is indexed by Thomson Reuters CPCI-S (WoS).This collection presents, and analyses, the new ideas in the emerging technologies involved in the production and use of particle beams and plasmas.
Autoren/Hrsg.
Fachgebiete
Weitere Infos & Material
X-Rays at the SIAM Photon Source
Study of Multicellular Living Organisms by SXCM (Soft X-Ray Contact Microscopy)
Radiation Production Using Femtosecond Electron Bunches
Femtosecond Electron Pulses Production System
A New Design and Computer Simulation of a 5-Electrode Ion Extraction/Focusing System
The Progress of Ion Beam Bioengineering in China
Plasma-Based Ion Implantation Treatments under Industrially Relevant Conditions
The Progress of the Research and Application of Ion Implantation Biotechnology in China
Formation of Aluminum Nitride Film for High Power Soft X-Ray Source Using Ion-Beam Assisted Deposition Method
Development of In Situ Atomic Force Microscopy for Study of Ion Beam Interaction with Biological Cell Surface
Ion Beam Synthesis of Silicon Carbide
Search for Enhanced D+D+D Reactions under D+ Beam Irradiation into TiDx Targets
Bunch Compression of a Non-Relativistic 280-keV-He+ Beam
Vacuum Arc Plasma Guns and Ion Sources
Seeing Inside a Hot Plasma: Photoionization of Ions
DLC-Film Schottky Barrier Diodes
Development of High Voltage High Frequency Resonant Inverter Power Supply for Atmospheric Surface Glow Barrier Discharges
Inactivation and Destruction of Bacillus Subtilis Using a Low Pressure Glow Discharge Plasma
Efficiency of Energy Transfer in a Small Plasma Focus Device
Sterilization Performance of Ultraviolet Emission from Laser Plasmas
Formation and Characteristics of the Low Dielectric Carbon Doped Silicon Oxide Thin Film Deposited by MTMS/O2 – ICPCVD
Ion Beam Modification of Carbon Materials
Anti-Corrosion Properties of Nitrogen and Oxygen Plasma-Implanted Nickel-Titanium Shape Memory Alloy
Structural and Conductive Changes of Alumina Ceramics and Silicon Crystal Implanted with High-Flux Ti Ion