E-Book, Englisch, 412 Seiten
Wang Lattice Engineering
Erscheinungsjahr 2013
ISBN: 978-981-4364-25-6
Verlag: Pan Stanford Publishing
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
Technology and Applications
E-Book, Englisch, 412 Seiten
ISBN: 978-981-4364-25-6
Verlag: Pan Stanford Publishing
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)
This book contains comprehensive reviews of different technologies to harness lattice mismatch in semiconductor heterostructures and their applications in electronic and optoelectronic devices. While the book is a bit focused on metamorphic epitaxial growth, it also includes other methods like compliant substrate, selective area growth, wafer bonding and heterostructure nanowires etc. Basic knowledge on dislocations in semiconductors and innovative methods to eliminate threading dislocations are provided, and successful device applications are reviewed. It covers a variety of important semiconductor materials like SiGe, III-V including GaN and nano-wires; epitaxial methods like molecular beam epitaxy and metal organic vapor phase epitaxy; and devices like transistors and lasers etc.
Autoren/Hrsg.
Fachgebiete
- Naturwissenschaften Physik Elektromagnetismus Halbleiter- und Supraleiterphysik
- Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Halb- und Supraleitertechnologie
- Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik
Weitere Infos & Material
Dislocation Reduction by Interfacial Misfit Method. Compliant Substrates. Selective Area Growth. Low Temperature Direct Wafer Bonding. Heterostructures and Strain Relaxation In Semiconductor Nanowires. Epitaxial Growth of Nitrides. Metamorphic HEMT Technology. Metamorphic Hbts, Metamorphic Quantum Dot Lasers. Metamorphic Quantum Well Lasers. Nitride Based LEDS And Laser Diodes.