Lattice Engineering

1. Auflage 2012
ISBN: 978-981-4316-29-3
Verlag: Pan Stanford

Buch, Englisch, 412 Seiten, Format (B × H): 152 mm x 229 mm, Gewicht: 688 g

This book contains comprehensive reviews of different technologies used to harness lattice mismatch in semiconductor heterostructures and their applications in electronic and optoelectronic devices. It also covers methods such as compliant substrate, selective area growth, wafer bonding, and heterostructure nanowires. Basic knowledge on dislocations in semiconductors and innovative methods to eliminate threading dislocations are provided, and successful device applications are reviewed. It covers important semiconductor materials, epitaxial methods, and devices.

Zielgruppe

Academic and Postgraduate

Autoren/Hrsg.

Wang, Shumin

Fachgebiete

• Naturwissenschaften Physik Elektromagnetismus Halbleiter- und Supraleiterphysik
• Technische Wissenschaften Maschinenbau | Werkstoffkunde Technische Mechanik | Werkstoffkunde Materialwissenschaft: Elektronik, Optik
• Technische Wissenschaften Elektronik | Nachrichtentechnik Elektronik Halb- und Supraleitertechnologie

Inhaltsverzeichnis

Dislocation Reduction by Interfacial Misfit Method. Compliant Substrates. Selective Area Growth. Low Temperature Direct Wafer Bonding. Heterostructures and Strain Relaxation In Semiconductor Nanowires. Epitaxial Growth of Nitrides. Metamorphic HEMT Technology. Metamorphic Hbts, Metamorphic Quantum Dot Lasers. Metamorphic Quantum Well Lasers. Nitride Based LEDS And Laser Diodes.

Über Autor(innen)

Shumin Wang is Professor at Photonics Laboratory, Department of Microtechnology and Nanoscience, Chalmers University of Technology, Sweden. He received BSc and MSc from Department of Physics, Fudan University, China, in 1985 and 1988, respectively, and PhD from Department of Physics, Gothenburg University, Sweden, in 1994. He has been then working at Chalmers University of Technology, Sweden, since 1994, and was promoted to Associate Professor and Professor in 1999 and 2008, respectively.