Brodusch / Demers / Gauvin Field Emission Scanning Electron Microscopy

New Perspectives for Materials Characterization
1. Auflage 2018
ISBN: 978-981-10-4433-5
Verlag: Springer Singapore
Format: PDF
Kopierschutz: 1 - PDF Watermark

E-Book, Englisch, 143 Seiten, eBook

Reihe: SpringerBriefs in Applied Sciences and Technology

This book highlights what is now achievable in terms of materials characterization with the new generation of cold-field emission scanning electron microscopes applied to real materials at high spatial resolution. It discusses advanced scanning electron microscopes/scanning- transmission electron microscopes (SEM/STEM), simulation and post-processing techniques at high spatial resolution in the fields of nanomaterials, metallurgy, geology, and more. These microscopes now offer improved performance at very low landing voltage and high -beam probe current stability, combined with a routine transmission mode capability that can compete with the (scanning-) transmission electron microscopes (STEM/-TEM) historically run at higher beam accelerating voltage

Zielgruppe

Research

Autoren/Hrsg.

Brodusch, Nicolas

Demers, Hendrix

Gauvin, Raynald

Inhaltsverzeichnis

1;Contents;6
2;Acronyms;9
3;Symbols;11
4;1 Introduction;13
4.1;References;15
5;2 Developments in Field Emission Gun Technologies and Advanced Detection Systems;17
5.1;2.1 Cold-Field Emission Technology;17
5.2;2.2 CFE-SEM for Low Voltage Microscopy;20
5.3;2.3 Scanning Transmission Microscopy in the SEM;23
5.4;References;23
6;3 Electron Detection Strategies for High Resolution Imaging: Deceleration and Energy Filtration;25
6.1;3.1 Principles;25
6.2;3.2 Application of Dual In-Lens Electron Detection;34
6.3;3.3 Energy filtration;38
6.4;References;46
7;4 Low Voltage SEM;48
7.1;4.1 Strategy of Characterization: Deceleration and Energy Filtration;49
7.2;4.2 High Resolution Imaging;50
7.3;4.3 Low Voltage, Specimen Charging, and Material Contrast;52
7.4;4.4 Ultra-Low Voltage SEM: Uses and Limitations;54
7.5;References;56
8;5 Low Voltage STEM in the SEM;58
8.1;References;63
9;6 The f-Ratio Method for X-Ray Microanalysis in the SEM;65
9.1;6.1 The Limits of X-Ray Microanalysis Models;65
9.2;6.2 Description of the f-Ratio Method;65
9.2.1;6.2.1 f-Ratio Method for Binary System;67
9.2.2;6.2.2 Generalization of the f-Ratio Method for Multi-elements;69
9.3;6.3 Examples of Quantitative X-Ray Analysis Using the f-Ratio Method;69
9.3.1;6.3.1 Binary Examples;69
9.3.1.1;6.3.1.1 Quantification of Au–Cu Binary Alloy with a CFE-SEM;69
9.3.1.2;6.3.1.2 Quantification of Al–Mg Diffusion Couple;71
9.3.2;6.3.2 Multi-elements Example;71
9.3.2.1;6.3.2.1 Quantification of Al–Mg–Zn Ternary Alloy with a CFE-SEM;71
9.4;6.4 Summary;73
9.5;References;73
10;7 X-Ray Imaging with a Silicon Drift Detector Energy Dispersive Spectrometer;76
10.1;7.1 X-Ray Emission Rate with Low Accelerating Voltage and Thin Film;77
10.2;7.2 Comparison of Silicon Drift Detector Geometry;79
10.2.1;7.2.1 Solid Angle;80
10.2.2;7.2.2 Takeoff Angle;81
10.3;7.3 X-Ray Map Acquisition at High Spatial Resolution and High Signal-to-Noise Ratio;83
10.3.1;7.3.1 Low Accelerating Voltage;84
10.3.2;7.3.2 Low Voltage STEM;86
10.3.3;7.3.3 Phase Map Analysis;88
10.3.4;7.3.4 Removal of the Effect of Electron Channeling on X-Ray Emission in Thin Specimens;90
10.4;7.4 Summary;91
10.5;References;91
11;8 Electron Diffraction Techniques in the SEM;94
11.1;8.1 Electron Channeling Contrast Imaging;95
11.2;8.2 Low Voltage STEM Defects Imaging;98
11.3;8.3 Electron Backscatter Diffraction;100
11.4;8.4 Dark-Field Electron Backscatter Diffraction;102
11.5;8.5 Transmission Forward Electron Backscatter Diffraction;105
11.6;8.6 Dark-Field Imaging with a Forecaster Detector in Transmission Mode;109
11.7;References;110
12;9 Magnetic Domain Imaging;115
12.1;9.1 Type-I Contrast;115
12.2;9.2 Type-II Contrast;116
12.3;9.3 Type-III Contrast;119
12.4;References;120
13;10 Advanced Specimen Preparation;122
13.1;10.1 Surface Preparation;122
13.2;10.2 Surface Cleaning;126
13.3;10.3 Charging Compensation with Ionic Liquid Treatment;129
13.4;References;133
14;11 Conclusion and Perspectives;136
15;Index;139

Über Autor(innen)

Mr. Nicolas Brodusch is the Chief Electron Microscopist in the material engineering department at McGill University, Canada since 2010. He graduated at the Université Paris-Sud, Orsay, France in Material Engineering in 1997. Involved in the field of electron microscopies since 2007, he is research interested in developing and improving new scanning electron microscopy techniques to push the limits of imaging and analysis in the field of materials science and nanomaterials. He is a world leader in diffraction and transmission techniques in the scanning electron microscope. He was awarded in 2014 for the Best Techniques and Instrumentation Development paper for year 2013 in the Microscopy and Microanalysis journal. Dr. Hendrix Demers is a Research Associate in material engineering department at McGill University, Montreal, Canada since 2012. He received his PhD in Mining and Materials Engineering at the McGill University, Montreal, Canada in 2008. He is involved in the field of microscopy and microanalysis by developing new methods for quantitative x-ray microanalysis, for materials characterization, and data and image analysis. He is also author and co-author of a world-renowned research softwares (Win X-Ray, MC X-ray, and CASINO) and aims at helping SEM users in their X-ray microanalyses, metrology applications and in more advanced applications such as electron beam lithography. He won the Castaing Award in 2008 for the best student paper and the Heinrich Award in 2010 for the Outstanding Young Scientist from the Microbeam Analysis Society of America. He is also an Academic Editor of the Scanning journal. Prof. Raynald Gauvin is full Professor at McGill University, Montréal, Canada. His research interest are related in developing new methods to characterize the microstructure of materials using high resolution scanning electron microscopy with x-ray microanalysis and Monte Carlo simulations. He is the creator of the CASINO program that is used by morethan 10 000 users in the world. He has more than 300 papers in scientific journals and conference proceedings. He was Invited Speaker in more than 100 international scientific conferences. He won several scientific prices, most notably the 31st Canadian Materials Physics Medal in 2007 by the Metallurgical Society of the Canadian Institute of Mining, the Heinrich Award in 1997 from the Microbeam Analysis Society of America and the Prix d'excellence du Président de l’École for the best Doctorate Thesis defended in 1990 at l’École Polytechnique de Montréal. Pr. Gauvin was the President of the Inter American Societies of Electron Microscopy (CIASEM) from 2009 to 2011, the President of the Microbeam Analysis Society of America (MAS) from 2005 to 2006, the President of the Microscopical Society of Canada (SMC) from 2001 to 2003 and the President of the International Union of the Microbeam Analysis Societies (IUMAS) from 2000 to 2005. He is currently the holder of the Birks Chair in Metallurgy.