Landis Nano Lithography

1. Auflage 2013
ISBN: 978-1-118-62162-2
Verlag: John Wiley & Sons
Format: PDF
Kopierschutz: Adobe DRM (»Systemvoraussetzungen)

E-Book, Englisch, 320 Seiten, E-Book

Lithography is an extremely complex tool - based on theconcept of "imprinting" an original template versiononto mass output - originally using relatively simple opticalexposure, masking, and etching techniques, and now extended toinclude exposure to X-rays, high energy UV light, and electronbeams - in processes developed to manufacture everydayproducts including those in the realms of consumer electronics,telecommunications, entertainment, and transportation, to name buta few. In the last few years, researchers and engineers have pushedthe envelope of fields including optics, physics, chemistry,mechanics and fluidics, and are now developing the nanoworld withnew tools and technologies. Beyond the scientific challenges thatare endemic in this miniaturization race, next generationlithography techniques are essential for creating new devices, newfunctionalities and exploring new application fields.
Nanolithography is the branch of nanotechnology concerned with thestudy and application of fabricating nanometer-scale structures& #8722; meaning the creation of patterns with at least onelateral dimension between the size of an individual atom andapproximately 100 nm. It is used in the fabrication of leading-edgesemiconductor integrated circuits (nanocircuitry) ornanoelectromechanical systems (NEMS).
This book addresses physical principles as well as the scientificand technical challenges of nanolithography, covering X-ray andNanoImprint lithography, as well as techniques using scanning probemicroscopy and the optical properties of metal nanostructures,patterning with block copolymers, and metrology forlithography.
It is written for engineers or researchers new to the field, andwill help readers to expand their knowledge of technologies thatare constantly evolving.

Autoren/Hrsg.

Landis, Stefan

Inhaltsverzeichnis

Foreword xi
Jörge DE SOUSA NORONHA
Introduction xvii
Michel BRILLOUËT
Chapter 1. X-ray Lithography: Fundamentals and Applications1
Massimo TORMEN, Gianluca GRENCI, Benedetta MARMIROLI and FilippoROMANATO
1.1. Introduction 1
1.2. The principle of X-ray lithography 5
1.3. The physics of X-ray lithography 25
1.4. Applications 55
1.5. Appendix 1 79
1.6. Bibliography 79
Chapter 2. NanoImprint Lithography 87
Stefan LANDIS
2.1. From printing to NanoImprint 87
2.2. A few words about NanoImprint 90
2.3. The fabrication of the mold 96
2.4. Separating the mold and the resist after imprint:de-embossing 100
2.5. The residual layer problem in NanoImprint 118
2.6. Residual layer thickness measurement 132
2.7. A few remarks on the mechanical behavior of molds and flowproperties of the nanoimprint process 148
2.8. Conclusion 157
2.9. Bibliography 157
Chapter 3. Lithography Techniques Using Scanning ProbeMicroscopy 169
Vincent BOUCHIAT
3.1. Introduction 169
3.2. Presentation of local-probe microscopes 170
3.3. General principles of local-probe lithography techniques171
3.4. Classification of surface structuring techniques usinglocal-probe microscopes 173
3.5. Lithographic techniques with polymer resist mask 179
3.6. Lithography techniques using oxidation-reductioninteractions 185
3.7. "Passive" lithography techniques 198
3.8. Conclusions and perspectives 200
3.9. Bibliography 201
Chapter 4. Lithography and Manipulation Based on the OpticalProperties of Metal Nanostructures 207
Renaud BACHELOT and Marianne CONSONNI
4.1. Introduction 207
4.2. Surface plasmons 208
4.3 Localized plasmon optical lithography 216
4.4. Delocalized surface plasmon optical lithography 222
4.5. Conclusions, discussions and perspectives 225
4.6. Bibliography 226
Chapter 5. Patterning with Self-Assembling Block Copolymers231
Karim AISSOU, Martin KOGELSCHATZ, Claire AGRAFFEIL, AlinaPASCALE and Thierry BARON
5.1. Block copolymers: a nano-lithography technique fortomorrow? 231
5.2. Controlling self-assembled block copolymer films 233
5.3. Technological applications of block copolymer films 237
5.4. Bibliography 244
Chapter 6. Metrology for Lithography 249
Johann FOUCHER and Jérôme HAZART
6.1. Introduction 249
6.2. The concept of CD in metrology 250
6.3. Scanning electron microscopy (SEM) 254
6.4. 3D atomic force microscopy (AFM3D) 266
6.5. Grating optical diffractometry (or scatterometry) 286
6.6. What is the most suitable technique for lithography?310
6.7. Bibliography 316
List of Authors 321
Index 323